dc.contributor.authorLu, Gang
dc.contributor.authorChen, Yanhong
dc.contributor.authorLi, Bing
dc.contributor.authorZhou, Xiaozhu
dc.contributor.authorXue, Can
dc.contributor.authorMa, Jan
dc.contributor.authorBoey, Freddy Yin Chiang
dc.contributor.authorZhang, Hua
dc.date.accessioned2012-09-21T05:57:41Z
dc.date.available2012-09-21T05:57:41Z
dc.date.copyright2009en_US
dc.date.issued2009
dc.identifier.citationLu, G., Chen, Y., Li, B., Zhou, X., Xue, C., Ma, J., et al. (2009). Dip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol. The Journal of Physical Chemistry C, 113(10), 4184-4187.en_US
dc.identifier.issn1932-7447en_US
dc.identifier.urihttp://hdl.handle.net/10220/8602
dc.description.abstractThe etch resist ability of dip-pen nanolithography (DPN)-generated dot patterns of different alkanethiols on Au was systematically studied. After 16-mercaptohexadecanioc acid (MHA) and 1-octadecanethiol (ODT) dots with different diameters were patterned on a Au substrate by DPN, the substrate was etched in a feri-/ferrocyanide solution. Tapping mode AFM (TMAFM) was used to monitor the morphology change of the patterned dots during the wet chemical etching. The diameter and height of MHA and ODT dots at different etch time were measured by TMAFM. The resist ability of the patterned MHA and ODT SAMs on Au was compared. The result shows that the MHA patterns have better etch resist ability than do ODT patterns.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesThe journal of physical chemistry Cen_US
dc.rights© 2009 American Chemical Society.en_US
dc.subjectDRNTU::Engineering::Materials
dc.titleDip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiolen_US
dc.typeJournal Article
dc.contributor.schoolSchool of Materials Science and Engineeringen_US
dc.identifier.doihttp://dx.doi.org/10.1021/jp810746j


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