dc.contributor.authorLu, Gang
dc.contributor.authorZhou, Xiaozhu
dc.contributor.authorLi, Hai
dc.contributor.authorYin, Zongyou
dc.contributor.authorLi, Bing
dc.contributor.authorHuang, Ling
dc.contributor.authorBoey, Freddy Yin Chiang
dc.contributor.authorZhang, Hua
dc.date.accessioned2012-09-24T00:51:29Z
dc.date.available2012-09-24T00:51:29Z
dc.date.copyright2010en_US
dc.date.issued2010
dc.identifier.citationLu, G., Zhou, X., Li, H., Yin, Z., Li, B., Huang, L., et al. (2010). Nanolithography of single-layer graphene oxide films by atomic force microscopy. Langmuir, 26(9), 6164-6166.en_US
dc.identifier.issn0743-7463en_US
dc.identifier.urihttp://hdl.handle.net/10220/8603
dc.description.abstractAtomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesLangmuiren_US
dc.rights© 2010 American Chemical Society.en_US
dc.subjectDRNTU::Engineering::Materials
dc.titleNanolithography of single-layer graphene oxide films by atomic force microscopyen_US
dc.typeJournal Article
dc.contributor.schoolSchool of Materials Science and Engineeringen_US
dc.identifier.doihttp://dx.doi.org/10.1021/la101077t


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