dc.contributor.authorLam, Jeffrey C. K.
dc.contributor.authorHuang, Maggie Y. M.
dc.contributor.authorNg, Tsu Hau
dc.contributor.authorMohammed Khalid Dawood
dc.contributor.authorZhang, Fan
dc.contributor.authorDu, Anyan
dc.contributor.authorSun, Handong
dc.contributor.authorShen, Zexiang
dc.contributor.authorMai, Zhihong
dc.date.accessioned2013-05-03T08:27:28Z
dc.date.available2013-05-03T08:27:28Z
dc.date.copyright2013en_US
dc.date.issued2013
dc.identifier.citationLam, J. C. K., Huang, M. Y. M., Ng, T. H., Mohammed, K. D., Zhang, F., Du, A., et al. (2013). Evidence of ultra-low-k dielectric material degradation and nanostructure alteration of the Cu/ultra-low-k interconnects in time-dependent dielectric breakdown failure. Applied Physics Letters, 102(2).en_US
dc.identifier.issn00036951en_US
dc.identifier.urihttp://hdl.handle.net/10220/9881
dc.description.abstractUltra-low-k time-dependent dielectric breakdown (TDDB) is one of the most important reliability issues in Cu/low-k technology development due to its weaker intrinsic breakdown strength compared to SiO2 dielectrics. With continuous technology scaling, this problem is further exacerbated for Cu/ultra-low-k interconnects. In this letter, the TDDB degradation behavior of ultra-low-k dielectric in Cu/ultra-low-k interconnects will be investigated by a method consisting of a combination of Raman with Fourier transform infrared vibrational microscopes. In TDDB tests on Cu/low-k interconnect, it was found that intrinsic degradation of the ultra-low-k dielectric would first occur under electrical field stress. Upon further electrical field stress, the ultra-low-k dielectric degradation would be accelerated due to Ta ions migration from the Ta/TaN barrier bi-layer into the ultra-low-k dielectrics. In addition, no out-diffusion of Cu ions was observed in our investigation on Cu/Ta/TaN/ SiCOH structures.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesApplied physics lettersen_US
dc.rights© 2013 American Institute of Physics. This paper was published in Applied Physics Letters and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official DOI: http://dx.doi.org/10.1063/1.4776735. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.en_US
dc.subjectDRNTU::Science::Mathematics::Applied mathematics
dc.titleEvidence of ultra-low-k dielectric material degradation and nanostructure alteration of the Cu/ultra-low-k interconnects in time-dependent dielectric breakdown failureen_US
dc.typeJournal Article
dc.contributor.schoolSchool of Physical and Mathematical Sciencesen_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.4776735
dc.description.versionPublished versionen_US


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