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|Title:||The extended growth of graphene oxide flakes using ethanol CVD||Authors:||Huang, Jingfeng
Fam, Derrick Wen Hui
Nimmo, Myra A.
Tok, Alfred Iing Yoong
|Keywords:||DRNTU::Engineering::Materials||Issue Date:||2013||Source:||Huang, J., Larisika, M., Fam, W. H. D., He, Q., Nimmo, M. A., Nowak, C., et al. (2013). The extended growth of graphene oxide flakes using ethanol CVD. Nanoscale, 5(7), 2945-2951.||Series/Report no.:||Nanoscale||Abstract:||We report the extended growth of Graphene Oxide (GO) flakes using atmospheric pressure ethanol Chemical Vapor Deposition (CVD). GO was used to catalyze the deposition of carbon on a substrate in the ethanol CVD with Ar and H2 as carrier gases. Raman, SEM, XPS and AFM characterized the growth to be a reduced GO (RGO) of <5 layers. This newly grown RGO possesses lower defect density with larger and increased distribution of sp2 domains than chemically reduced RGO. Furthermore this method without optimization reduces the relative standard deviation of electrical conductivity between chips, from 80.5% to 16.5%, enabling RGO to be used in practical electronic devices.||URI:||https://hdl.handle.net/10356/96949
|DOI:||http://dx.doi.org/10.1039/c3nr33704a||Rights:||© 2013 The Royal Society of Chemistry. This is the author created version of a work that has been peer reviewed and accepted for publication by Nanoscale, The Royal Society of Chemistry. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: http://dx.doi.org/10.1039/c3nr33704a.||Fulltext Permission:||open||Fulltext Availability:||With Fulltext|
|Appears in Collections:||MSE Journal Articles|
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