Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/101406
Title: Phase and layer stability of Ni- and Ni(Pt)-silicides on narrow poly-Si lines
Authors: Mangelinck, D.
Dai, J. Y.
Chan, L.
Ding, Jun
Chi, Dong Zhi
Lee, Pooi See
Pey, Kin Leong
Keywords: DRNTU::Engineering::Materials
Issue Date: 2002
Source: Lee, P. S., Pey, K. L., Mangelick, D., Ding, J., Chi, D. Z., Dai, J. Y., et al. (2002). Phase and layer stability of Ni- and Ni(Pt)-silicides on narrow poly-Si lines. Journal of The Electrochemical Society, 149(6).
Series/Report no.: Journal of the electrochemical society
Abstract: The phase and morphology stability of NiSi and Ni(Pt)Si formed on the poly-Si lines and wide pads have been studied. Differences in the NiSi2 nucleation temperature and the extent of layer inversion have been analyzed. The nucleation of NiSi2 was hindered on the narrow poly-Si lines as compared to that on the large area poly-Si pads at 750°C. Stress is believed to play an important role in the delayed nucleation of NiSi2 . In addition, layer inversion was found to be less severe on the narrow poly-Si lines as compared to that on the poly-Si pads after being subjected to the same annealing condition. This is likely due to the limiting grain growth of the poly-Si in the narrow lines. Enhanced stability of Ni(Pt)Si was achieved up to 800°C on both poly-Si wide pads and narrow lines.
URI: https://hdl.handle.net/10356/101406
http://hdl.handle.net/10220/8059
DOI: 10.1149/1.1473192
Rights: © 2002 The Electrochemical Society. This paper was published in Journal of The Electrochemical Society and is made available as an electronic reprint (preprint) with permission of The Electrochemical Society. The paper can be found at the following official URL: http://dx.doi.org/10.1149/1.1473192. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Journal Articles

Files in This Item:
File Description SizeFormat 
101. Phase and layer stability of Ni- and Ni(Pt)-silicides on narrow poly-Si lines.pdf243.28 kBAdobe PDFThumbnail
View/Open

SCOPUSTM   
Citations 10

27
Updated on Jun 18, 2020

PublonsTM
Citations 10

23
Updated on Mar 6, 2021

Page view(s) 5

922
Updated on Nov 28, 2021

Download(s) 10

371
Updated on Nov 28, 2021

Google ScholarTM

Check

Altmetric


Plumx

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.