Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/102867
Title: Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser
Authors: Farrokhi, Hamid
Zhou, Wei
Zheng, Hongyu
Li, Zhongli
Keywords: DRNTU::Engineering::Mechanical engineering
Issue Date: 2014
Source: Farrokhi, H., Zhou, W., Zheng, H., & Li, Z. (2014). Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser. Journal of Computational and Theoretical Nanoscience, 11(1), 53-57.
Series/Report no.: Journal of computational and theoretical nanoscience
Abstract: Silicon is highly transparent to the infrared wavelength, so fiber laser with wavelength of 1090 nm is not regarded as a suitable tool for the purpose of ablation based surface texturing. However, we demonstrate, through finite element thermal analyses of laser irradiated surface, non-ablative texturing of Si surface is possible if suitable laser power and dwell time are used to produce peak temperatures above 1250 K and below the Si melting point of 1690 K. Localized oxidation occurs in the temperature range and results in formation of regularly patterned bumps.
URI: https://hdl.handle.net/10356/102867
http://hdl.handle.net/10220/19209
DOI: 10.1166/jctn.2014.3316
Rights: © 2014 American Scientific Publishers.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MAE Journal Articles

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