Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/103458
Title: Large scale low cost fabrication of diameter controllable silicon nanowire arrays
Authors: Sun, Leimeng
Fan, Yu
Wang, Xinghui
Agung Susantyoko, Rahmat
Zhang, Qing
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics
Issue Date: 2014
Source: Sun, L., Fan, Y., Wang, X., Agung, Susantyoko, R., & Zhang, Q. (2014). Large scale low cost fabrication of diameter controllable silicon nanowire arrays. Nanotechnology, 25(25).
Series/Report no.: Nanotechnology
Abstract: We report on a novel solution etching method to fabricate vertically aligned aperiodic silicon nanowire (SiNW) arrays. We begin with a simple dewetting process to fabricate a monolayer of well-spaced metal particles in situ on a silicon wafer. The particles function as a sacrificial template to pattern a Ti/Au catalyst film into a metal mesh and the size of particles directly determines the diameter of SiNW. A conventional metal-assisted chemical etching process is then carried out with the obtained metal mesh as a catalyst to realize a vertically aligned SiNW array at a large scale and low cost.
URI: https://hdl.handle.net/10356/103458
http://hdl.handle.net/10220/24497
ISSN: 0957-4484
DOI: 10.1088/0957-4484/25/25/255302
Rights: © 2014 IOP Publishing Ltd. This is the author created version of a work that has been peer reviewed and accepted for publication in Nanotechnology, published by Institute of Physics on behalf of IOP Publishing Ltd. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: [Article DOI: http://dx.doi.org/10.1088/0957-4484/25/25/255302].
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles

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