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https://hdl.handle.net/10356/103458
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DC Field | Value | Language |
---|---|---|
dc.contributor.author | Sun, Leimeng | en |
dc.contributor.author | Fan, Yu | en |
dc.contributor.author | Wang, Xinghui | en |
dc.contributor.author | Agung Susantyoko, Rahmat | en |
dc.contributor.author | Zhang, Qing | en |
dc.date.accessioned | 2014-12-22T01:18:27Z | en |
dc.date.accessioned | 2019-12-06T21:13:08Z | - |
dc.date.available | 2014-12-22T01:18:27Z | en |
dc.date.available | 2019-12-06T21:13:08Z | - |
dc.date.copyright | 2014 | en |
dc.date.issued | 2014 | en |
dc.identifier.citation | Sun, L., Fan, Y., Wang, X., Agung, Susantyoko, R., & Zhang, Q. (2014). Large scale low cost fabrication of diameter controllable silicon nanowire arrays. Nanotechnology, 25(25). | en |
dc.identifier.issn | 0957-4484 | en |
dc.identifier.uri | https://hdl.handle.net/10356/103458 | - |
dc.description.abstract | We report on a novel solution etching method to fabricate vertically aligned aperiodic silicon nanowire (SiNW) arrays. We begin with a simple dewetting process to fabricate a monolayer of well-spaced metal particles in situ on a silicon wafer. The particles function as a sacrificial template to pattern a Ti/Au catalyst film into a metal mesh and the size of particles directly determines the diameter of SiNW. A conventional metal-assisted chemical etching process is then carried out with the obtained metal mesh as a catalyst to realize a vertically aligned SiNW array at a large scale and low cost. | en |
dc.description.sponsorship | MOE (Min. of Education, S’pore) | en |
dc.format.extent | 14 p. | en |
dc.language.iso | en | en |
dc.relation.ispartofseries | Nanotechnology | en |
dc.rights | © 2014 IOP Publishing Ltd. This is the author created version of a work that has been peer reviewed and accepted for publication in Nanotechnology, published by Institute of Physics on behalf of IOP Publishing Ltd. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: [Article DOI: http://dx.doi.org/10.1088/0957-4484/25/25/255302]. | en |
dc.subject | DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics | en |
dc.title | Large scale low cost fabrication of diameter controllable silicon nanowire arrays | en |
dc.type | Journal Article | en |
dc.contributor.school | School of Electrical and Electronic Engineering | en |
dc.identifier.doi | 10.1088/0957-4484/25/25/255302 | en |
dc.description.version | Accepted version | en |
item.fulltext | With Fulltext | - |
item.grantfulltext | open | - |
Appears in Collections: | EEE Journal Articles |
Files in This Item:
File | Description | Size | Format | |
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Large scale low cost fabrication of diameter controllable silicon nanowire arrays.pdf | 770.83 kB | Adobe PDF | View/Open |
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