Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/105025
Title: Strain profile, electronic band structure and optical gain of self-assembled Ge quantum dots on SiGe virtual substrate
Authors: Bose, Sumanta
Fan, W. J.
Jian, C.
Zhang, D. H.
Tan, Chuan Seng
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Issue Date: 2014
Source: Bose, S., Fan, W. J., Jian, C., Zhang, D. H., & Tan, C. S. (2014). Strain profile, electronic band structure and optical gain of self-assembled Ge quantum dots on SiGe virtual substrate. Silicon-Germanium Technology and Device Meeting (ISTDM), 2014 7th International , 129-130. doi: 10.1109/ISTDM.2014.6874705 URL: http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=6874705&isnumber=6874620
Conference: 2014 7th International Silicon-Germanium Technology and Device Meeting (ISTDM)
Abstract: Group IV (Si, Ge, Sn) alloys are promising materials for future optoelectronic devices. Their compatibility with Si technology would allow us to engineer novel growth techniques and bandgap engineering methods to obtain direct band gap materials [1]. Other alloy compositions could allow wider wavelength range [2] which can revolutionize the photonics industry - leading to new design of LEDs, photodetectors, laser diodes and electro optical modulators.
URI: https://hdl.handle.net/10356/105025
http://hdl.handle.net/10220/20424
DOI: 10.1109/ISTDM.2014.6874705
Schools: School of Electrical and Electronic Engineering 
Research Centres: Centre for Micro-/Nano-electronics (NOVITAS) 
Rights: © 2014 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The published version is available at: [http://dx.doi.org/10.1109/ISTDM.2014.6874705].
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Conference Papers

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