Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/106083
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dc.contributor.authorTai Dam, Ducen
dc.contributor.authorLee, Jong-Minen
dc.date.accessioned2013-11-15T05:40:22Zen
dc.date.accessioned2019-12-06T22:04:16Z-
dc.date.available2013-11-15T05:40:22Zen
dc.date.available2019-12-06T22:04:16Z-
dc.date.copyright2013en
dc.date.issued2013en
dc.identifier.citationTai Dam, D., & Lee, J. M. (2013). Ultrahigh pseudocapacitance of mesoporous Ni-doped Co(OH)2/ITO nanowires. Nano energy, 2,(6), 1186-1196.en
dc.identifier.issn2211-2855en
dc.identifier.urihttps://hdl.handle.net/10356/106083-
dc.description.abstractMesoporous Ni-doped Co(OH)2 was uniformly deposited along indium-tin oxide nanowires (ITO NWs) which were directly grown on titanium substrates by chemical vapor deposition followed by potentiostatic electrodeposition through a hexagonal liquid crystalline phase of a nonionic surfactant. The as-synthesized electrode is a network composed of ultrathin nanosheets with thickness of about 10 nm containing pores in the diameter range of 2–3 nm. The mesoporous nanowire electrode demonstrates extremely high specific capacitance of 2052 F g−1 at discharge current density of 1 A g−1 in an aqueous KOH solution. Moreover, the nanowires with mesoporous nanosheets exhibit superior pseudocapacitive behavior, lower capacitance fading, and better rate performance than films with mesoporous nanosheets.en
dc.language.isoenen
dc.relation.ispartofseriesNano energyen
dc.subjectDRNTU::Engineering::Materials::Energy materialsen
dc.titleUltrahigh pseudocapacitance of mesoporous Ni-doped Co(OH)2/ITO nanowiresen
dc.typeJournal Articleen
dc.contributor.schoolSchool of Chemical and Biomedical Engineeringen
dc.identifier.doi10.1016/j.nanoen.2013.05.002en
item.grantfulltextnone-
item.fulltextNo Fulltext-
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