Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/106772
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dc.contributor.authorHan, K.en
dc.contributor.authorHuang, Z.en
dc.contributor.authorZeng, S. W.en
dc.contributor.authorYang, M.en
dc.contributor.authorLi, C. J.en
dc.contributor.authorZhou, W. X.en
dc.contributor.authorWang, Renshaw Xiaoen
dc.contributor.authorVenkatesan, T.en
dc.contributor.authorCoey, J. M. D.en
dc.contributor.authorGoiran, M.en
dc.contributor.authorEscoffier, W.en
dc.contributor.authorAriandoen
dc.date.accessioned2019-06-27T02:35:56Zen
dc.date.accessioned2019-12-06T22:18:08Z-
dc.date.available2019-06-27T02:35:56Zen
dc.date.available2019-12-06T22:18:08Z-
dc.date.issued2017en
dc.identifier.citationHan, K., Huang, Z., Zeng, S. W., Yang, M., Li, C. J., Zhou, W. X., . . . Ariando. (2017). Electrical properties and subband occupancy at the (La, Sr)(Al, Ta)O3/SrTiO3 interface. Physical Review Materials, 1(1), 011601-. doi:10.1103/PhysRevMaterials.1.011601en
dc.identifier.urihttps://hdl.handle.net/10356/106772-
dc.description.abstractThe quasi-two-dimensional electron gas at oxide interfaces provides a platform for investigating quantum phenomena in strongly correlated electronic systems. Here, we study the transport properties at the high-mobility (La0.3Sr0.7) (Al0.65Ta0.35) O3/SrTiO3 interface. Before oxygen annealing, the as-grown interface exhibits a high electron density and electron occupancy of two subbands: higher-mobility electrons (μ1≈10^4 cm2 V−1s−1 at 2 K) occupy the lower-energy 3dxy subband, while lower-mobility electrons (μ1≈103cm2V−1s−1 at 2 K) propagate in the higher-energy 3dxz/yz-dominated subband. After removing oxygen vacancies by annealing in oxygen, only a single type of 3dxy electrons remain at the annealed interface, showing tunable Shubnikov–de Haas oscillations below 9 T at 2 K and an effective mass of 0.7me. By contrast, no oscillation is observed at the as-grown interface even when electron mobility is increased to 50 000 cm2V−1s−1 by gating voltage. Our results reveal the important roles of both carrier mobility and subband occupancy in tuning the quantum transport at oxide interfaces.en
dc.description.sponsorshipNRF (Natl Research Foundation, S’pore)en
dc.description.sponsorshipMOE (Min. of Education, S’pore)en
dc.format.extent6 p.en
dc.language.isoenen
dc.relation.ispartofseriesPhysical Review Materialsen
dc.rights© 2017 American Physical Society. All rights reserved. This paper was published in Physical Review Materials and is made available with permission of American Physical Society.en
dc.subjectElectronic Structureen
dc.subjectHall Effecten
dc.subjectDRNTU::Science::Physicsen
dc.titleElectrical properties and subband occupancy at the (La, Sr)(Al, Ta)O3/SrTiO3 interfaceen
dc.typeJournal Articleen
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen
dc.contributor.schoolSchool of Physical and Mathematical Sciencesen
dc.identifier.doi10.1103/PhysRevMaterials.1.011601en
dc.description.versionPublished versionen
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