Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/138338
Title: Valley-Hall photonic topological insulators with dual-band kink states
Authors: Chen, Qiaolu
Zhang, Li
He, Mengjia
Wang, Zuojia
Lin, Xiao
Gao, Fei
Yang, Yihao
Zhang, Baile
Chen, Hongsheng
Keywords: Science::Physics
Issue Date: 2019
Source: Chen, Q., Zhang, L., He, M., Wang, Z., Lin, X., Gao, F., . . . Chen, H. (2019). Valley-Hall photonic topological insulators with dual-band kink states. Advanced Optical Materials, 7(15), 1900036-. doi:10.1002/adom.201900036
Journal: Advanced Optical Materials
Abstract: Extensive researches have revealed that valley, a binary degree of freedom (DOF), can be an excellent candidate of information carrier. Recently, valley DOF is introduced into photonic systems, and several valley‐Hall photonic topological insulators (PTIs) are experimentally demonstrated. However, in the previous valley‐Hall PTIs, topological kink states only work at a single frequency band, which limits potential applications in multiband waveguides, filters, communications, and so on. To overcome this challenge, here a valley‐Hall PTI, where the topological kink states exist at two separated frequency bands, is experimentally demonstrated in a microwave substrate‐integrated circuitry. Both the simulated and experimental results demonstrate the dual‐band valley‐Hall topological kink states are robust against the sharp bends of the internal domain wall with negligible intervalley scattering. This work may pave the way for multichannel substrate‐integrated photonic devices with high efficiency and high capacity for information communications and processing.
URI: https://hdl.handle.net/10356/138338
ISSN: 2195-1071
DOI: 10.1002/adom.201900036
DOI (Related Dataset): 10.21979/N9/WOK97H
Schools: School of Physical and Mathematical Sciences 
Organisations: Centre for Disruptive Photonic Technologies
The Photonics Institute
Rights: © 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. All rights reserved. This paper was published in Advanced Optical Materials and is made available with permission of WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Journal Articles

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