Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/138338
Title: | Valley-Hall photonic topological insulators with dual-band kink states | Authors: | Chen, Qiaolu Zhang, Li He, Mengjia Wang, Zuojia Lin, Xiao Gao, Fei Yang, Yihao Zhang, Baile Chen, Hongsheng |
Keywords: | Science::Physics | Issue Date: | 2019 | Source: | Chen, Q., Zhang, L., He, M., Wang, Z., Lin, X., Gao, F., . . . Chen, H. (2019). Valley-Hall photonic topological insulators with dual-band kink states. Advanced Optical Materials, 7(15), 1900036-. doi:10.1002/adom.201900036 | Journal: | Advanced Optical Materials | Abstract: | Extensive researches have revealed that valley, a binary degree of freedom (DOF), can be an excellent candidate of information carrier. Recently, valley DOF is introduced into photonic systems, and several valley‐Hall photonic topological insulators (PTIs) are experimentally demonstrated. However, in the previous valley‐Hall PTIs, topological kink states only work at a single frequency band, which limits potential applications in multiband waveguides, filters, communications, and so on. To overcome this challenge, here a valley‐Hall PTI, where the topological kink states exist at two separated frequency bands, is experimentally demonstrated in a microwave substrate‐integrated circuitry. Both the simulated and experimental results demonstrate the dual‐band valley‐Hall topological kink states are robust against the sharp bends of the internal domain wall with negligible intervalley scattering. This work may pave the way for multichannel substrate‐integrated photonic devices with high efficiency and high capacity for information communications and processing. | URI: | https://hdl.handle.net/10356/138338 | ISSN: | 2195-1071 | DOI: | 10.1002/adom.201900036 | DOI (Related Dataset): | 10.21979/N9/WOK97H | Schools: | School of Physical and Mathematical Sciences | Organisations: | Centre for Disruptive Photonic Technologies The Photonics Institute |
Rights: | © 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. All rights reserved. This paper was published in Advanced Optical Materials and is made available with permission of WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
Appears in Collections: | SPMS Journal Articles |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
1812.11069.pdf | 1.49 MB | Adobe PDF | ![]() View/Open |
SCOPUSTM
Citations
10
61
Updated on May 2, 2025
Web of ScienceTM
Citations
5
50
Updated on Oct 29, 2023
Page view(s)
308
Updated on May 5, 2025
Download(s) 20
286
Updated on May 5, 2025
Google ScholarTM
Check
Altmetric
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.