Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/140430
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dc.contributor.authorLi, Guangyuanen_US
dc.contributor.authorLiu, Xinfengen_US
dc.contributor.authorWang, Xingzhien_US
dc.contributor.authorYuan, Yanwenen_US
dc.contributor.authorSum, Tze Chienen_US
dc.contributor.authorXiong, Qihuaen_US
dc.date.accessioned2020-05-29T01:49:03Z-
dc.date.available2020-05-29T01:49:03Z-
dc.date.issued2015-
dc.identifier.citationLi, G., Liu, X., Wang, X., Yuan, Y., Sum, T. C., & Xiong, Q. (2015). Purified plasmonic lasing with strong polarization selectivity by reflection. Optics Express, 23(12), 15657-15669. doi:10.1364/OE.23.015657en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttps://hdl.handle.net/10356/140430-
dc.description.abstractAs miniaturized light sources of size beyond the optical diffraction limit, surface plasmon lasers are of particular interest for numerous exciting applications. Although convincing demonstrations of plasmonic lasing have been reported with the metal-insulator-semiconductor (MIS) hybrid design using semiconductor nanomaterials, it remains a challenge that conventional photonic lasing may be triggered and misinterpreted as plasmonic lasing. One way to address this issue is to cut off photonic modes in the waveguide by strictly restricting the semiconductor thickness. Here we propose a novel hybrid design, namely the dielectric-metal-insulator-semiconductor (DMIS) design that potentially solves the challenge. Taking advantage of strong polarization selectivity by reflection effect in favor of the plasmonic mode, whispering-gallery mode cavities based on the proposed DMIS design suppress possible photonic lasing modes and relieve the semiconductor thickness for purified plasmonic lasing. Using these cavities, we demonstrate room-temperature purified plasmon lasing with cadmium sulphide square nanobelts atop of a deposited multilayer film. Approaches for further improvement of the plamsonic lasing performance are discussed. Our design provides a reliable platform for developing better surface plasmon nanolasers using new semiconductor nanomaterials.en_US
dc.description.sponsorshipNRF (Natl Research Foundation, S’pore)en_US
dc.description.sponsorshipMOE (Min. of Education, S’pore)en_US
dc.language.isoenen_US
dc.relation.ispartofOptics Expressen_US
dc.rights© 2015 Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.en_US
dc.subjectScience::Physicsen_US
dc.titlePurified plasmonic lasing with strong polarization selectivity by reflectionen_US
dc.typeJournal Articleen
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.contributor.schoolSchool of Physical and Mathematical Sciencesen_US
dc.contributor.organizationNOVITAS, Nanoelectronics Centre of Excellenceen_US
dc.identifier.doi10.1364/OE.23.015657-
dc.description.versionAccepted versionen_US
dc.identifier.pmid26193545-
dc.identifier.scopus2-s2.0-84962613926-
dc.identifier.issue12en_US
dc.identifier.volume23en_US
dc.identifier.spage15657en_US
dc.identifier.epage15669en_US
dc.subject.keywordsSemiconductor Lasersen_US
dc.subject.keywordsSurface Plasmonsen_US
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