Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/141458
Title: Design of a force-controlled end-effector with low-inertia effect for robotic polishing using macro-mini robot approach
Authors: Abd El Khalick Mohammad
Hong, Jie
Wang, Danwei
Keywords: Engineering::Electrical and electronic engineering
Issue Date: 2017
Source: Abd El Khalick Mohammad, Hong, J., & Wang, D. (2018). Design of a force-controlled end-effector with low-inertia effect for robotic polishing using macro-mini robot approach. Robotics and Computer-Integrated Manufacturing, 49, 54-65. doi:10.1016/j.rcim.2017.05.011
Journal: Robotics and Computer-Integrated Manufacturing
Abstract: In this paper, the novel design of a force-controlled end-effector for automated polishing processes is presented. The proposed end-effector is to be integrated into a macro-mini robot polishing cell. The macro robot (in this study, it is a six-axis industrial robot) is used to position the mini robot (the proposed end-effector) according to the workpiece profile while the mini robot controls the polishing force. Th end-effector has a polishing head that can be extended and retracted by a linear hollow voice coil actuator to provide tool compliance. The main advantage of the proposed design is that it allows this motion without extending or retracting the polishing motor nor spindle, which reduces the inertial effects that may results in undesired vibrations. By integrating a force sensor, the polishing force is measured and fed back to the controller to regulate it according to the polishing pre-planned requirements. The effectiveness of the proposed device to track a certain desired force with step changes under different feed rates has been examined through polishing experiments. The results demonstrate the effectiveness of the presented device to reduce the vibration and achieve remarkable force tracking.
URI: https://hdl.handle.net/10356/141458
ISSN: 0736-5845
DOI: 10.1016/j.rcim.2017.05.011
Rights: © 2017 Elsevier Ltd. All rights reserved.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:EEE Journal Articles

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