Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/141461
Title: | Synergistic integrated design of an electrochemical mechanical polishing end-effector for robotic polishing applications | Authors: | Abd El Khalick Mohammad Hong, Jie Wang, Danwei Guan, Yisheng |
Keywords: | Engineering::Electrical and electronic engineering | Issue Date: | 2018 | Source: | Abd El Khalick Mohammad, Hong, J., Wang, D., & Guan, Y. (2019). Synergistic integrated design of an electrochemical mechanical polishing end-effector for robotic polishing applications. Robotics and Computer-Integrated Manufacturing, 55, 65-75. doi:10.1016/j.rcim.2018.07.005 | Journal: | Robotics and Computer-Integrated Manufacturing | Abstract: | In this paper, we present a novel design of a robotic electrochemical mechanical polishing (ECMP) process. Firstly, the process is presented to replace the conventional ECMP process by a robotic-based one. The advantage of using industrial robots lies in their flexibility, reconfigurability, large workspace and low prices compared to the conventional systems. Secondly, a novel design of a force-controlled end-effector for this purpose is presented. The end-effector is integrated into a macro-mini robot polishing cell. The macro robot (an industrial robotic manipulator) is used to position the mini robot (the proposed end-effector) according to the workpiece profile while the mini robot controls the polishing force. The effectiveness of the proposed device to polish un-milled and milled surfaces has been examined through polishing experiments. The results demonstrate the effectiveness of the presented device to reduce the surface roughness and improve the reflectability and appearance. | URI: | https://hdl.handle.net/10356/141461 | ISSN: | 0736-5845 | DOI: | 10.1016/j.rcim.2018.07.005 | Rights: | © 2018 Elsevier Ltd. All rights reserved. | Fulltext Permission: | none | Fulltext Availability: | No Fulltext |
Appears in Collections: | EEE Journal Articles |
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