Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/141780
Title: An application of incremental scheduling to a cluster photolithography tool
Authors: Ware, Simon
Su, Rong
Keywords: Engineering::Electrical and electronic engineering
Issue Date: 2017
Source: Ware, S., & Su, R. (2017). An application of incremental scheduling to a cluster photolithography tool. IFAC-PapersOnLine, 50(1), 1114-1120. doi:10.1016/j.ifacol.2017.08.393
Abstract: Optimization is an important area of research. As many optimization problems are NP-Hard it is important to have a wide selection of heuristic approaches to choose from when solving problems. Prioritized planning is a technique traditionally used to solve the multi-robot path planning problem. In this paper we investigate how incremental scheduling, a technique based upon prioritized planning can be applied to scheduling wafer processing in a cluster tool. For our test case our approach is shown to be capable of finding a plan of equal quality to other scheduling approaches and thus suggests our method could be of potential use in other manufacturing/material handling applications.
URI: https://hdl.handle.net/10356/141780
ISSN: 2405-8963
Rights: © 2017 IFAC (International Federation of Automatic Control) Hosting by Elsevier Ltd. This is an open-access article distributed under the terms of the Creative Commons Attribution License.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Conference Papers

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