Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/141790
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dc.contributor.authorShivakumar, Ranjanaen_US
dc.contributor.authorBolker, Asafen_US
dc.contributor.authorTsang, Siu Honen_US
dc.contributor.authorAtar, Nuriten_US
dc.contributor.authorVerker, Ronenen_US
dc.contributor.authorGouzman, Irinaen_US
dc.contributor.authorHala, Moren_US
dc.contributor.authorMoshe, Nehoraen_US
dc.contributor.authorJones, Alexandraen_US
dc.contributor.authorGrossman, Eitanen_US
dc.contributor.authorMinton, Timothy K.en_US
dc.contributor.authorTeo, Edwin Hang Tongen_US
dc.date.accessioned2020-06-10T13:43:57Z-
dc.date.available2020-06-10T13:43:57Z-
dc.date.issued2020-
dc.identifier.citationShivakumar, R., Bolker, A., Tsang, S. H., Atar, N., Verker, R., Gouzman, I., . . . Teo, E. H. T. (2020). POSS enhanced 3D graphene - polyimide film for atomic oxygen endurance in low earth orbit space environment. Polymer, 191, 122270-. doi:10.1016/j.polymer.2020.122270en_US
dc.identifier.issn0032-3861en_US
dc.identifier.urihttps://hdl.handle.net/10356/141790-
dc.description.abstractRecently, 3D-graphene infused polyimide (3DC/PI) films have shown to be an effective protection coating for electrostatic discharge in spacecraft. However, these films are not suitable for Low Earth Orbit (LEO) due to atomic oxygen (AO) erosion. Here, we used Polyhedral Oligomeric Silsesquioxane (POSS) to enhance the AO durability of 3D-C/PI films. Three different ways of adding POSS to the composite films were studied with ground-based AO exposure. For all infusion approaches, their electrical conductivity behaviour is well preserved and the presence of POSS results in reduced AO erosion yield. Of all the methods studied here, incorporating POSS directly into PI results in the lowest erosion yield of 4.67 × 10−25 cm3/O-atom (one order of magnitude lower than that of Kapton). Adding POSS to PI, extends the durability of the composite film beyond 10 years, making it an ideal protective material for long term mission in LEO.en_US
dc.language.isoenen_US
dc.relation.ispartofPolymeren_US
dc.rights© 2020 Elsevier Ltd. All rights reserved. This paper was published in Polymer and is made available with permission of Elsevier Ltd.en_US
dc.subjectEngineering::Materialsen_US
dc.titlePOSS enhanced 3D graphene - polyimide film for atomic oxygen endurance in low earth orbit space environmenten_US
dc.typeJournal Articleen
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.contributor.researchTemasek Laboratoriesen_US
dc.identifier.doi10.1016/j.polymer.2020.122270-
dc.description.versionAccepted versionen_US
dc.identifier.volume191en_US
dc.subject.keywords3D-C Foamsen_US
dc.subject.keywordsPOSSen_US
item.fulltextWith Fulltext-
item.grantfulltextopen-
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