Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/143392
Title: A generic gate driver for SiC MOSFETs with adjustable positive and negative rail voltage
Authors: Li, Yeo Howe
Kanamarlapudi, Venkata Ravi Kishore
Keywords: Engineering::Electrical and electronic engineering
Issue Date: 2019
Source: Li, Y. H., & Kanamarlapudi, V. R. K. (2018). A generic gate driver for SiC MOSFETs with adjustable positive and negative rail voltage. Proceedings of the 2018 Asian Conference on Energy, Power and Transportation Electrification (ACEPT 2018), 1-5. doi:10.1109/ACEPT.2018.8610828
Conference: 2018 Asian Conference on Energy, Power and Transportion Electrification (ACEPT 2018)
Abstract: SiC MOSFETs are well known for possessing lower losses compared with silicon MOSFETS or IGBTs. In order to drive them efficiently, suitable drivers must be designed. However, most commercially available drivers and drivers in literature are suitable for only a limited range of SiC MOSFETs due to limitations on the MOSFET's gate voltage ratings. Hence, the drivers do not allow the designer to easily experiment with different SiC MOSFET models. In this paper, a generic SiC gate driver with adjustable positive and negative voltage rail is presented. The performance of the proposed driver is compared with a commercially available driver through experiment and it is shown that the proposed gate driver is able to drive the chosen SiC MOSFET more efficiently.
URI: https://hdl.handle.net/10356/143392
ISBN: 978-1-5386-8137-4
DOI: 10.1109/ACEPT.2018.8610828
Research Centres: Energy Research Institute @ NTU (ERI@N) 
Rights: © 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The published version is available at: https://doi.org/10.1109/ACEPT.2018.8610828.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:ERI@N Conference Papers

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