Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/143426
Title: | Two-photon-assisted polymerization and reduction : emerging formulations and applications | Authors: | Lay, Chee Leng Koh, Charlynn Sher Lin Lee, Yih Hong Phan-Quang, Gia Chuong Sim, Howard Yi Fan Leong, Shi Xuan Han, Xuemei Phang, In Yee Ling, Xing Yi |
Keywords: | Science::Physics | Issue Date: | 2020 | Source: | Lay, C. L., Koh, C. S. L., Lee, Y. H., Phan-Quang, G. C., Sim, H. Y. F., Leong, S. X., ... Ling, X. Y. (2020). Two-photon-assisted polymerization and reduction : emerging formulations and applications. ACS Applied Materials & Interfaces, 12(9), 10061-10079. doi:10.1021/acsami.9b20911 | Journal: | ACS Applied Materials & Interfaces | Abstract: | Two-photon lithography (TPL) is an emerging approach to fabricate complex multifunctional micro/nanostructures. This is because TPL can easily develop various 2D and 3D structures on a variety of surfaces, and there has been a rapidly expanding pool of processable photoresists to create different materials. However, challenges in developing two-photon processable photoresists currently impede progress in TPL. In this review, we critically discuss the importance of photoresist formulation in TPL. We begin by evaluating the commercial photoresists to design micro/nanostructures for promising applications in anti-counterfeiting, superomniphobicity, and micromachines with movable parts. Next, we discuss emerging hydrogel/organogel photoresists, focusing on customizing photoresist formulations to fabricate reconfigurable structures that can respond to changes in local pH, solvent, and temperature. We also review the development of metal salt-based photoresists for direct metal writing, whereby various formulations have been developed to enable applications in online sensing, catalysis, and electronics. Finally, we provide a critical outlook and highlight various outstanding challenges in formulating processable photoresists for TPL. | URI: | https://hdl.handle.net/10356/143426 | ISSN: | 1944-8244 | DOI: | 10.1021/acsami.9b20911 | Schools: | School of Physical and Mathematical Sciences | Organisations: | Institute of Materials Research and Engineering, A*STAR | Rights: | This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Applied Materials & Interfaces, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acsami.9b20911 | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
Appears in Collections: | SPMS Journal Articles |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
Two photon assisted Polymerization and Reduction Emerging Formulations and Applications.pdf | 1.45 MB | Adobe PDF | View/Open |
SCOPUSTM
Citations
10
46
Updated on Mar 17, 2024
Web of ScienceTM
Citations
10
38
Updated on Oct 30, 2023
Page view(s)
262
Updated on Mar 15, 2024
Download(s) 10
424
Updated on Mar 15, 2024
Google ScholarTM
Check
Altmetric
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.