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Title: Double-spiral hexagonal boron nitride and shear strained coalescence boundary
Authors: Park, Hyo Ju
Tay, Roland Yingjie
Wang, Xiao
Zhao, Wen
Kim, Jung Hwa
Ruoff, Rodney S.
Ding, Feng
Teo, Edwin Hang Tong
Lee, Zonghoon
Keywords: Engineering::Electrical and electronic engineering
Issue Date: 2019
Source: Park, H. J., Tay, R. Y., Wang, X., Zhao, W., Kim, J. H., Ruoff, R. S., . . . Lee, Z. (2019). Double-spiral hexagonal boron nitride and shear strained coalescence boundary. Nano Letters, 19(7), 4229-4236. doi:10.1021/acs.nanolett.8b05034
Journal: Nano letters
Abstract: Among the different growth mechanisms for two-dimensional (2D) hexagonal boron nitride (h-BN) synthesized using chemical vapor deposition, spiraling growth of h-BN has not been reported. Here we report the formation of intertwined double-spiral few-layer h-BN that is driven by screw dislocations located at the antiphase boundaries of monolayer domains. The microstructure and stacking configurations were studied using a combination of dark-field and atomic resolution transmission electron microscopy. Distinct from other 2D materials with single-spiral structures, the double-spiral structure enables the intertwined h-BN layers to preserve the most stable AA′ stacking configuration. We also found that the occurrence of shear strains at the boundaries of merged spiral islands is dependent on the propagation directions of encountering screw dislocations and presented the strained features by density functional theory calculations and atomic image simulations. This study unveils the double-spiral growth of 2D h-BN multilayers and the creation of a shear strain band at the coalescence boundary of two h-BN spiral clusters.
ISSN: 1530-6984
DOI: 10.1021/acs.nanolett.8b05034
Schools: School of Electrical and Electronic Engineering 
School of Materials Science and Engineering 
Research Centres: Temasek Laboratories 
Rights: This document is the Accepted Manuscript version of a Published Work that appeared in final form in Nano letters, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles

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