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Title: New family of plasmonic photocatalysts without noble metals
Authors: Wan, Dongyang
Yan, Bixing
Chen, Jianqiang
Wu, Shuyang
Hong, Jindui
Song, Dongsheng
Zhao, Xiaoxu
Chi, Xiao
Zeng, Shengwei
Huang, Zhen
Li, Changjian
Han, Kun
Zhou, Wenxiong
Cao, Yu
Rusydi, Andrivo
Pennycook, Stephen J.
Yang, Ping
Xu, Rong
Xu, Qing-Hua
Wang, Renshaw Xiao
Venkatesan, Thirumalai
Keywords: Engineering::Electrical and electronic engineering
Issue Date: 2019
Source: Wan, D., Yan, B., Chen, J., Wu, S., Hong, J., Song, D., … Venkatesan, T. (2019). New Family of Plasmonic Photocatalysts without Noble Metals. Chemistry of Materials, 31(7), 2320–2327. doi:10.1021/acs.chemmater.8b04185
Journal: Chemistry of Materials
Abstract: Efficient photocatalysis is important for sustainable energy. Recently, an unconventional photocatalyst based on intrinsic plasmon, called intrinsic plasmonic photocatalyst (IPP), seems promising for higher efficiency in hydrogen evolution. This catalyst seems to benefit from the advantages of visible light absorption, plasmon-assisted hot carrier generation, and good catalytic stability over conventional semiconductor photocatalysts. In this work, we report the relative hydrogen evolution efficiency under visible light irradiation of a family of IPP based on alkaline earth niobates (MNbO3, where M = Ca, Sr, or Ba), with efficiency of CaNbO3 > SrNbO3 > BaNbO3. The contributions of electron–phonon coupling time constant and solar energy absorption to the hydrogen evolution efficiency are identified as key based on our comprehensive study and characterization of carrier density (1022 cm–3), plasmon absorption, carrier dynamics, and surface area. This study demonstrates a generic approach to create a family of IPPs and further validates the role of solar energy absorption by intrinsic plasmon resonance in the enhancement of photocatalytic efficiency.
ISSN: 0897-4756
DOI: 10.1021/acs.chemmater.8b04185
Rights: This document is the Accepted Manuscript version of a Published Work that appeared in final form in Chemistry of Materials, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles

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