Please use this identifier to cite or link to this item:
|Title:||A novel fabrication technique for three-dimensional concave nanolens arrays||Authors:||Duan, Tianli
Ang, Diing Shenp
|Keywords:||Engineering::Electrical and electronic engineering||Issue Date:||2020||Source:||Duan, T., Xu, K., Liu, Z., Gu, C., Pan, J., Ang, D. S., . . . Ma, X. (2020). A novel fabrication technique for three-dimensional concave nanolens arrays. Journal of Materiomics, 6(3), 557-562. doi:10.1016/j.jmat.2020.04.003||Journal:||Journal of Materiomics||Abstract:||A novel facile technique is proposed for fabricating three-dimensional (3D) concave nanolens arrays on a silicon substrate. The technique leverages an inherent characteristic of the polymethyl methacrylate (PMMA) resist during inductively coupled plasma (ICP) etching. The tendency for plasma ions to accumulate at the edge of the PMMA resist helps create a local electric field that causes the ions to etch the sidewall of the PMMA resist. This process progressively increases the uncovered area, resulting in a graded etched depth or a concave structure in the substrate. In addition, using a given ICP etching recipe, the time required for a PMMA resist to be removed by sidewall etching is determined by its width. The use of PMMA resist of different widths enables one to achieve structures of varying etched depths and thus a 3D lens array. Optical characteristics of the fabricated nanolens were simulated using the FDTD (Finite-difference time-domain) method, and focal lengths ranging from 150 nm to 420 nm were obtained. This type of nanolens is very useful in ultraviolet optical devices and CMOS image sensors.||URI:||https://hdl.handle.net/10356/145437||ISSN:||2352-8478||DOI:||10.1016/j.jmat.2020.04.003||Rights:||© 2020 The Chinese Ceramic Society. Production and hosting by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).||Fulltext Permission:||open||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Journal Articles|
Updated on Dec 9, 2022
Updated on Dec 9, 2022
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.