Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/145437
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dc.contributor.authorDuan, Tianlien_US
dc.contributor.authorXu, Kangen_US
dc.contributor.authorLiu, Zhihongen_US
dc.contributor.authorGu, Chenjieen_US
dc.contributor.authorPan, Jishengen_US
dc.contributor.authorAng, Diing Shenpen_US
dc.contributor.authorZhang, Ruien_US
dc.contributor.authorWang, Yaoen_US
dc.contributor.authorMa, Xuhangen_US
dc.date.accessioned2020-12-21T08:59:20Z-
dc.date.available2020-12-21T08:59:20Z-
dc.date.issued2020-
dc.identifier.citationDuan, T., Xu, K., Liu, Z., Gu, C., Pan, J., Ang, D. S., . . . Ma, X. (2020). A novel fabrication technique for three-dimensional concave nanolens arrays. Journal of Materiomics, 6(3), 557-562. doi:10.1016/j.jmat.2020.04.003en_US
dc.identifier.issn2352-8478en_US
dc.identifier.urihttps://hdl.handle.net/10356/145437-
dc.description.abstractA novel facile technique is proposed for fabricating three-dimensional (3D) concave nanolens arrays on a silicon substrate. The technique leverages an inherent characteristic of the polymethyl methacrylate (PMMA) resist during inductively coupled plasma (ICP) etching. The tendency for plasma ions to accumulate at the edge of the PMMA resist helps create a local electric field that causes the ions to etch the sidewall of the PMMA resist. This process progressively increases the uncovered area, resulting in a graded etched depth or a concave structure in the substrate. In addition, using a given ICP etching recipe, the time required for a PMMA resist to be removed by sidewall etching is determined by its width. The use of PMMA resist of different widths enables one to achieve structures of varying etched depths and thus a 3D lens array. Optical characteristics of the fabricated nanolens were simulated using the FDTD (Finite-difference time-domain) method, and focal lengths ranging from 150 nm to 420 nm were obtained. This type of nanolens is very useful in ultraviolet optical devices and CMOS image sensors.en_US
dc.language.isoenen_US
dc.relation.ispartofJournal of Materiomicsen_US
dc.rights© 2020 The Chinese Ceramic Society. Production and hosting by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).en_US
dc.subjectEngineering::Electrical and electronic engineeringen_US
dc.titleA novel fabrication technique for three-dimensional concave nanolens arraysen_US
dc.typeJournal Articleen
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.identifier.doi10.1016/j.jmat.2020.04.003-
dc.description.versionPublished versionen_US
dc.identifier.issue3en_US
dc.identifier.volume6en_US
dc.identifier.spage557en_US
dc.identifier.epage562en_US
dc.subject.keywordsConcave Nanolensen_US
dc.subject.keywordsThree-dimensional Lens Arrayen_US
item.grantfulltextopen-
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