Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/146050
Title: Fabrication of zinc substrate encapsulated by fluoropolyurethane and its drag-reduction enhancement by chemical etching
Authors: Li, Yuanzhe
Cui, Zhe
Zhu, Qiucheng
Narasimalu, Srikanth
Dong, Zhili
Keywords: Engineering::Materials
Issue Date: 2020
Source: Li, Y., Cui, Z., Zhu, Q., Narasimalu, S., & Dong, Z. (2020). Fabrication of zinc substrate encapsulated by fluoropolyurethane and its drag-reduction enhancement by chemical etching. Coatings, 10(4), 377-. doi:10.3390/coatings10040377
Journal: Coatings 
Abstract: A fluoropolyurethane-encapsulated process was designed to rapidly fabricate low-flow resistance surfaces on the zinc substrate. For the further enhancement of the drag-reduction effect, Cu2+-assisted chemical etching was introduced during the fabrication process, and its surface morphology, wettability, and flow-resistance properties in a microchannel were also studied. It is indicated that the zinc substrate with a micro-nanoscale roughness obtained by Cu2+-assisted nitric acid etching was superhydrophilic. However, after the etched zinc substrate is encapsulated with fluoropolyurethane, the superhydrophobic wettability can be obtained with a contact angle of 154.8° ± 2.5° and a rolling angle of less than 10°. As this newly fabricated surface was placed into a non-standard design microchannel, it was found that with the increase of Reynolds number, the drag-reduction rate of the superhydrophobic surface remained basically unchanged at 4.0% compared with the original zinc substrate. Furthermore, the prepared superhydrophobic surfaces exhibited outstanding reliability in most liquids.
URI: https://hdl.handle.net/10356/146050
ISSN: 2079-6412
DOI: 10.3390/coatings10040377
Schools: School of Materials Science and Engineering 
Research Centres: Energy Research Institute @ NTU (ERI@N) 
Rights: © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open-access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Journal Articles

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