Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/148836
Title: Biaxially strained germanium crossbeam with a high-quality optical cavity for on-chip laser applications
Authors: Jung, Yongduck
Kim, Youngmin
Burt, Daniel
Joo, Hyo-Jun
Kang, Dong-Ho
Luo, Manlin
Chen, Melvina
Lin, Zhang
Tan, Chuan Seng
Nam, Donguk
Keywords: Engineering::Electrical and electronic engineering
Issue Date: 2021
Source: Jung, Y., Kim, Y., Burt, D., Joo, H., Kang, D., Luo, M., Chen, M., Lin, Z., Tan, C. S. & Nam, D. (2021). Biaxially strained germanium crossbeam with a high-quality optical cavity for on-chip laser applications. Optics Express, 29(10), 14174-14181. https://dx.doi.org/10.1364/OE.417330
Project: NRF2018-NRF-ANR009 TIGER
NRF-CRP19-2017-01
MOE2018-T2-2-011
RG 148/19
iGrant of Singapore (A2083c0053)
Journal: Optics Express
Abstract: The creation of CMOS compatible light sources is an important step for the realization of electronic-photonic integrated circuits. An efficient CMOS-compatible light source is considered the final missing component towards achieving this goal. In this work, we present a novel crossbeam structure with an embedded optical cavity that allows both a relatively high and fairly uniform biaxial strain of ~0.9% in addition to a high-quality factor of >4,000 simultaneously. The induced biaxial strain in the crossbeam structure can be conveniently tuned by varying geometrical factors that can be defined by conventional lithography. Comprehensive photoluminescence measurements and analyses confirmed that optical gain can be significantly improved via the combined effect of low temperature and high strain, which is supported by a three-fold reduction of the full width at half maximum of a cavity resonance at ~1,940 nm. Our demonstration opens up the possibility of further improving the performance of germanium lasers by harnessing geometrically amplified biaxial strain.
URI: https://hdl.handle.net/10356/148836
ISSN: 1094-4087
DOI: 10.1364/OE.417330
Rights: © 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles

Page view(s)

117
Updated on Jan 20, 2022

Download(s)

13
Updated on Jan 20, 2022

Google ScholarTM

Check

Altmetric


Plumx

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.