Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/149971
Title: A base-stabilized silylene-promoted C(sp³)-H borylation and H₂ activation
Authors: Khoo, Sabrina
Siu, Chi-Kit
So, Cheuk-Wai
Keywords: Science::Chemistry::Inorganic chemistry
Issue Date: 2020
Source: Khoo, S., Siu, C. & So, C. (2020). A base-stabilized silylene-promoted C(sp³)-H borylation and H₂ activation. Inorganic Chemistry, 59(14), 9551-9559. https://dx.doi.org/10.1021/acs.inorgchem.0c00426
Project: 1421200081
RG 121/17
NRF2018-NRF-ANR026 Si-POP
Journal: Inorganic Chemistry
Abstract: Treatment of the amidinato amidosilylene [L{(Me3Si)2N}Si:] [1, L = PhC(NtBu)2] with a slight excess of borane-tetrahydrofuran complex [BH3·THF] in toluene at room temperature afforded the silylene-borane adduct [L{(Me3Si)2N}Si:→BH3] (2). A triflate substituent was introduced on the boron center by reacting 2 with methyl triflate [MeOTf] (OTf = OSO2CF3) in toluene at room temperature to form [L{(Me3Si)2N}Si:→BH2OTf] (3), with the elimination of CH4 gas. The intramolecular C(sp3)-H borylation and H2 elimination occurred by reacting complex 3 with 1 in refluxing toluene to form a C-B bond in the resulting silylene-boronium ion 5. Complex 5 activated H2 gas or NH3BH3 at room temperature to form silylene-borane adduct 2 and [L{(Me3Si)2N}Si-H]OTf. Additionally, the reaction of 5 with H2 was studied through density functional theory calculations.
URI: https://hdl.handle.net/10356/149971
ISSN: 0020-1669
DOI: 10.1021/acs.inorgchem.0c00426
Rights: This document is the Accepted Manuscript version of a Published Work that appeared in final form in Inorganic Chemistry, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acs.inorgchem.0c00426.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Journal Articles

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