Please use this identifier to cite or link to this item:
Title: Defect engineering in two common types of dielectric materials for electromagnetic absorption applications
Authors: Quan, Bin
Shi, Wenhao
Ong, Samuel Jun Hoong
Lu, Xiaochi
Wang, Paul Luyuan
Ji, Guangbin
Guo , Yufeng
Zheng, Lirong
Xu, Zhichuan Jason
Keywords: Engineering::Materials
Issue Date: 2019
Source: Quan, B., Shi, W., Ong, S. J. H., Lu, X., Wang, P. L., Ji, G., Guo , Y., Zheng, L. & Xu, Z. J. (2019). Defect engineering in two common types of dielectric materials for electromagnetic absorption applications. Advanced Functional Materials, 29(28), 1901236-.
Journal: Advanced Functional Materials
Abstract: Dielectric materials are greatly desired for electromagnetic absorption applications. Lots of research shows that conduction loss and polarization are two of the most important factors determining complex permittivity. However, the detailed dissipation mechanisms for the improved microwave absorption performance are often based on semiempirical rules, lacking practical data relationships between conduction loss/polarization and dielectric behaviors. Here, a strategy of introducing point defects is used to understand such underlying relationships, where polarizability and conductivity are adjustable by manipulating oxygen deficiency or heteroatoms. Based on first principles calculations and the applied oxygen-deficient strategy, dielectric polarization is shown to be dominant in determining the permittivity behaviors in semiconductors. Meanwhile, the presented nitrogen doping strategy shows that conduction loss is dominant in determining the permittivity behavior in graphitized carbon materials. The validity of the methods for using point defects to explore the underlying relations between conduction loss/polarization and dielectric behaviors in semiconductor and graphitized carbon are demonstrated for the first time, which are of great importance in optimizing the microwave absorption performance by defect engineering and electronic structure tailoring.
ISSN: 1616-301X
DOI: 10.1002/adfm.201901236
Rights: © 2019 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim. All rights reserved.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

Page view(s)

Updated on Jul 27, 2021

Google ScholarTM




Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.