Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/150361
Title: Formation of germanium (Ge) – based waveguides for infrared application
Authors: Zhong, Jian
Keywords: Engineering::Mechanical engineering
Issue Date: 2021
Publisher: Nanyang Technological University
Source: Zhong, J. (2021). Formation of germanium (Ge) – based waveguides for infrared application. Final Year Project (FYP), Nanyang Technological University, Singapore. https://hdl.handle.net/10356/150361
Project: P-B049
Abstract: Germanium-tin (Ge0.9Sn0.1) alloy is one of the complementary metal-oxide-semiconductor (CMOS) compatible materials in group-IV of the periodic table. Due to the large lattice mismatch between GeSn and Silicon (Si) substrate, the defects will generate within the GeSn layer. Currently, thin GeSn acts as a direct-band gap for near-mid infrared light source and photodetector. The report will show how to grow a high-quality single-crystalline GeSn (~1 μm) on germanium (Ge) buffer on Si substrate. The GeSn layer has low compression stress (-0.3%). A set of GeSn pedestal waveguide with a width of 1.25 μm has been fabricated. By measured the transmission power of GeSn at 3.74 μm, the results for propagation loss and bending loss are approximated to be 1.81 dB/cm and 0.19 dB/bend, respectively. Using infrared spectrometry, the GeSn waveguide is shown to have a transparency window to be longer than 25 μm.
URI: https://hdl.handle.net/10356/150361
DOI (Related Dataset): 10.1109/JPHOT.2021.3059452
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MAE Student Reports (FYP/IA/PA/PI)

Files in This Item:
File Description SizeFormat 
FORMATION OF GERMANIUM (Ge) – BASED WAVEGUIDES FOR INFRARED APPLICATION.pdf
  Restricted Access
1.73 MBAdobe PDFView/Open

Page view(s)

123
Updated on Jul 1, 2022

Google ScholarTM

Check

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.