Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/150450
Title: Process control and predictive model for machine data in epitaxy growths
Authors: Sim, Stanley Jia Yi
Keywords: Engineering::Electrical and electronic engineering::Semiconductors
Issue Date: 2021
Publisher: Nanyang Technological University
Source: Sim, S. J. Y. (2021). Process control and predictive model for machine data in epitaxy growths. Final Year Project (FYP), Nanyang Technological University, Singapore. https://hdl.handle.net/10356/150450
Abstract: Semiconductor epitaxy growths are very popular in microfabrication and optoelectronic devices fabrications. In the epitaxy process, reactors generate a lot of data every second. This data could be used to improve processes through automation and analytics. This report proposes practical solutions/proof-of-concepts that are showcased with the wealth of open-source resources readily available online namely- Google Cloud Platform (free tier/credits) for automation and analytics, and Python libraries such as Numpy, Pandas and TensorFlow/Keras for data processing and machine learning.
URI: https://hdl.handle.net/10356/150450
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Student Reports (FYP/IA/PA/PI)

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