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https://hdl.handle.net/10356/150450| Title: | Process control and predictive model for machine data in epitaxy growths | Authors: | Sim, Stanley Jia Yi | Keywords: | Engineering::Electrical and electronic engineering::Semiconductors | Issue Date: | 2021 | Publisher: | Nanyang Technological University | Source: | Sim, S. J. Y. (2021). Process control and predictive model for machine data in epitaxy growths. Final Year Project (FYP), Nanyang Technological University, Singapore. https://hdl.handle.net/10356/150450 | Abstract: | Semiconductor epitaxy growths are very popular in microfabrication and optoelectronic devices fabrications. In the epitaxy process, reactors generate a lot of data every second. This data could be used to improve processes through automation and analytics. This report proposes practical solutions/proof-of-concepts that are showcased with the wealth of open-source resources readily available online namely- Google Cloud Platform (free tier/credits) for automation and analytics, and Python libraries such as Numpy, Pandas and TensorFlow/Keras for data processing and machine learning. | URI: | https://hdl.handle.net/10356/150450 | Fulltext Permission: | restricted | Fulltext Availability: | With Fulltext |
| Appears in Collections: | EEE Student Reports (FYP/IA/PA/PI) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Sim Jia Yi Stanley (FYP Final Report).pdf Restricted Access | 5.14 MB | Adobe PDF | View/Open |
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