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|Title:||Fabrication of aligned carbon nanotubes on Cu catalyst by dc plasma-enhanced catalytic decomposition||Authors:||Zhang, Zhejuan
Tay, Beng Kang
Tan, Chong Wei
|Keywords:||Engineering::Electrical and electronic engineering||Issue Date:||2009||Source:||Zhang, Z., Shakerzadeh, M., Tay, B. K., Li, X., Tan, C. W., Lin, L., Guo, P., Feng, T. & Sun, Z. (2009). Fabrication of aligned carbon nanotubes on Cu catalyst by dc plasma-enhanced catalytic decomposition. Applied Surface Science, 255(12), 6404-6407. https://dx.doi.org/10.1016/j.apsusc.2009.02.025||Journal:||Applied Surface Science||Abstract:||Aligned multi-walled carbon nanotubes (ACNTs) are deposited using copper (Cu) catalyst on Chromium (Cr)-coated substrate by plasma-enhanced chemical vapor deposition at temperature of 700 °C. Acetylene gas has been used as the carbon source while ammonia is used for diluting and etching. The thicknesses of Cu films on Cr-coated Si (100) substrates are controlled by deposition time of magnetron sputtering. The growth behaviors and quality of ACNTs are investigated by scanning electron microscopy (SEM) and transmission electron microscopy. The different performance of ACNTs on various Cu films is explained by referring to the graphitic order as detected by Raman spectroscopy. The results indicate that the ACNTs are formed in tip-growth model where Cu is used as a novel catalyst, and the thickness of Cu films is responsible to the diameter and quality of synthesized CNTs.||URI:||https://hdl.handle.net/10356/151176||ISSN:||0169-4332||DOI:||10.1016/j.apsusc.2009.02.025||Rights:||© 2009 Elsevier B.V. All rights reserved.||Fulltext Permission:||none||Fulltext Availability:||No Fulltext|
|Appears in Collections:||EEE Journal Articles|
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