Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/151192
Title: Microstructure and electrical properties of in-situ annealed carbon films
Authors: Shakerzadeh, Maziar
Tay, Beng Kang
Teo, Edwin Hang Tong
Tan, Chong Wei
Keywords: Engineering::Electrical and electronic engineering
Issue Date: 2010
Source: Shakerzadeh, M., Tay, B. K., Teo, E. H. T. & Tan, C. W. (2010). Microstructure and electrical properties of in-situ annealed carbon films. 2010 3rd International Nanoelectronics Conference (INEC), 230-231. https://dx.doi.org/10.1109/INEC.2010.5424651
Abstract: The microstructure and electrical properties of in-situ annealed carbon films is studied in this paper. The structure of the films is studied by transmission electron microscopy, electron energy loss spectroscopy and Raman spectroscopy. The microstructure of the films strongly depends on the deposition temperature for the films deposited at high temperatures (higher than 400°C). However, at low temperatures the substrate bias is the other crucial factor which governs the microstructure of the film. Electrical conductivity of the film strongly depends on the formation of preferred orientation in the microstructure of the films.
URI: https://hdl.handle.net/10356/151192
ISBN: 9781424435449
DOI: 10.1109/INEC.2010.5424651
Rights: © 2010 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The published version is available at: https://doi.org/10.1109/INEC.2010.5424651.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Conference Papers

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