Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/151193
Title: Microstructure and through-film electrical characteristics of vertically aligned amorphous carbon films
Authors: Tan, Chong Wei
Shakerzadeh, Maziar
Teo, Edwin Hang Tong
Tay, Beng Kang
Keywords: Engineering::Electrical and electronic engineering
Issue Date: 2011
Source: Tan, C. W., Shakerzadeh, M., Teo, E. H. T. & Tay, B. K. (2011). Microstructure and through-film electrical characteristics of vertically aligned amorphous carbon films. Diamond and Related Materials, 20(3), 290-293. https://dx.doi.org/10.1016/j.diamond.2011.01.010
Project: ARC 13/08
Journal: Diamond and Related Materials
Abstract: The microstructure and electrical properties of in-situ annealed carbon films is studied in this paper. In-situ annealing (150 °C to 600 °C) was done during the deposition of carbon films with −300 V substrate bias. Transmission electron microscopy and two points electrical probing studies were performed and the deduced transition for vertical orientated graphitic planes occurs at temperatures above 400 °C. The microstructure of the films strongly depends on the deposition temperature of the films (room temperature, 400 °C and 600 °C). Electrical conductivity of the film strongly depends on texturing due to the formation of preferred orientation in the vertical direction. The vertically orientated carbon (VOC) sheet provides effective nanochannels for electron transport, thus significantly improves the electrical properties of the annealed film.
URI: https://hdl.handle.net/10356/151193
ISSN: 0925-9635
DOI: 10.1016/j.diamond.2011.01.010
Rights: © 2011 Elsevier B.V. All rights reserved.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:EEE Journal Articles

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