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|Title:||Microstructure and through-film electrical characteristics of vertically aligned amorphous carbon films||Authors:||Tan, Chong Wei
Teo, Edwin Hang Tong
Tay, Beng Kang
|Keywords:||Engineering::Electrical and electronic engineering||Issue Date:||2011||Source:||Tan, C. W., Shakerzadeh, M., Teo, E. H. T. & Tay, B. K. (2011). Microstructure and through-film electrical characteristics of vertically aligned amorphous carbon films. Diamond and Related Materials, 20(3), 290-293. https://dx.doi.org/10.1016/j.diamond.2011.01.010||Project:||ARC 13/08||Journal:||Diamond and Related Materials||Abstract:||The microstructure and electrical properties of in-situ annealed carbon films is studied in this paper. In-situ annealing (150 °C to 600 °C) was done during the deposition of carbon films with −300 V substrate bias. Transmission electron microscopy and two points electrical probing studies were performed and the deduced transition for vertical orientated graphitic planes occurs at temperatures above 400 °C. The microstructure of the films strongly depends on the deposition temperature of the films (room temperature, 400 °C and 600 °C). Electrical conductivity of the film strongly depends on texturing due to the formation of preferred orientation in the vertical direction. The vertically orientated carbon (VOC) sheet provides effective nanochannels for electron transport, thus significantly improves the electrical properties of the annealed film.||URI:||https://hdl.handle.net/10356/151193||ISSN:||0925-9635||DOI:||10.1016/j.diamond.2011.01.010||Rights:||© 2011 Elsevier B.V. All rights reserved.||Fulltext Permission:||none||Fulltext Availability:||No Fulltext|
|Appears in Collections:||EEE Journal Articles|
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