Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/152582
Title: Self-resonant microlasers of colloidal quantum wells constructed by direct deep patterning
Authors: Gheshlaghi, Negar
Foroutan-Barenji, Sina
Erdem, Onur
Altintas, Yemliha
Shabani, Farzan
Muhammad Hamza Humayun
Demir, Hilmi Volkan
Keywords: Science::Physics
Engineering::Electrical and electronic engineering
Issue Date: 2021
Source: Gheshlaghi, N., Foroutan-Barenji, S., Erdem, O., Altintas, Y., Shabani, F., Muhammad Hamza Humayun & Demir, H. V. (2021). Self-resonant microlasers of colloidal quantum wells constructed by direct deep patterning. Nano Letters, 21(11), 4598-4605. https://dx.doi.org/10.1021/acs.nanolett.1c00464
Project: NRF-NRFI2016-08
152 73 00025
Journal: Nano Letters
Abstract: Here, the first account of self-resonant fully colloidal μ-lasers made from colloidal quantum well (CQW) solution is reported. A deep patterning technique is developed to fabricate well-defined high aspect-ratio on-chip CQW resonators made of grating waveguides and in-plane reflectors. The fabricated waveguide-coupled laser, enabling tight optical confinement, assures in-plane lasing. CQWs of the patterned layers are closed-packed with sharp edges and residual-free lifted-off surfaces. Additionally, the method is successfully applied to various nanoparticles including colloidal quantum dots and metal nanoparticles. It is observed that the patterning process does not affect the nanocrystals (NCs) immobilized in the attained patterns and the different physical and chemical properties of the NCs remain pristine. Thanks to the deep patterning capability of the proposed method, patterns of NCs with subwavelength lateral feature sizes and micron-scale heights can possibly be fabricated in high aspect ratios.
URI: https://hdl.handle.net/10356/152582
ISSN: 1530-6984
DOI: 10.1021/acs.nanolett.1c00464
Rights: This document is the Accepted Manuscript version of a Published Work that appeared in final form in Nano Letters, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acs.nanolett.1c00464.
Fulltext Permission: embargo_20220613
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles
SPMS Journal Articles

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