Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/154947
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dc.contributor.authorRendón-Barraza, Carolinaen_US
dc.contributor.authorChan, Eng Aiken_US
dc.contributor.authorYuan, Guanghuien_US
dc.contributor.authorAdamo, Giorgioen_US
dc.contributor.authorPu, Tanchaoen_US
dc.contributor.authorZheludev, Nikolay, I.en_US
dc.date.accessioned2022-03-25T06:41:42Z-
dc.date.available2022-03-25T06:41:42Z-
dc.date.issued2021-
dc.identifier.citationRendón-Barraza, C., Chan, E. A., Yuan, G., Adamo, G., Pu, T. & Zheludev, N. I. (2021). Deeply sub-wavelength non-contact optical metrology of sub-wavelength objects. APL Photonics, 6(6), 066107-. https://dx.doi.org/10.1063/5.0048139en_US
dc.identifier.issn2378-0967en_US
dc.identifier.urihttps://hdl.handle.net/10356/154947-
dc.description.abstractMicroscopes and various forms of interferometers have been used for decades in optical metrology of objects that are typically larger than the wavelength of light λ. Metrology of sub-wavelength objects, however, was deemed impossible due to the diffraction limit. We report the measurement of the physical size of sub-wavelength objects with deeply sub-wavelength accuracy by analyzing the diffraction pattern of coherent light scattered by the objects with deep learning enabled analysis. With a 633 nm laser, we show that the width of sub-wavelength slits in an opaque screen can be measured with an accuracy of ∼λ/130 for a single-shot measurement or ∼λ/260 (i.e., 2.4 nm) when combining measurements of diffraction patterns at different distances from the object, thus challenging the accuracy of scanning electron microscopy and ion beam lithography. In numerical experiments, we show that the technique could reach an accuracy beyond λ/1000. It is suitable for high-rate non-contact measurements of nanometric sizes of randomly positioned objects in smart manufacturing applications with integrated metrology and processing tools.en_US
dc.description.sponsorshipAgency for Science, Technology and Research (A*STAR)en_US
dc.description.sponsorshipMinistry of Education (MOE)en_US
dc.language.isoenen_US
dc.relationMOE2016-T3-1-006en_US
dc.relationSERC A1685b0005en_US
dc.relation.ispartofAPL Photonicsen_US
dc.rights© 2021 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).en_US
dc.subjectScience::Physicsen_US
dc.titleDeeply sub-wavelength non-contact optical metrology of sub-wavelength objectsen_US
dc.typeJournal Articleen
dc.contributor.schoolSchool of Physical and Mathematical Sciencesen_US
dc.contributor.researchCentre for Disruptive Photonic Technologies (CDPT)en_US
dc.contributor.researchThe Photonics Instituteen_US
dc.identifier.doi10.1063/5.0048139-
dc.description.versionPublished versionen_US
dc.identifier.scopus2-s2.0-85108678515-
dc.identifier.issue6en_US
dc.identifier.volume6en_US
dc.identifier.spage066107en_US
dc.subject.keywordsDeep Learningen_US
dc.subject.keywordsOptical Metrologyen_US
dc.description.acknowledgementThe authors acknowledge the Singapore Ministry of Education (Grant No. MOE2016-T3-1-006); the Agency for Science, Technology and Research (A∗ STAR), Singapore (Grant No. SERC A1685b0005); and the Engineering and Physical Sciences Research Council UK (Grants No. EP/N00762X/1 and No. EP/M0091221), and the European Research Council (Advanced grant FLEET786851). T.P. acknowledges support from the China Scholarship Council (CSC No. 201804910540).en_US
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