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Title: Janus particle preparation through UV-induced partial photodegradation of spin-coated particle films
Authors: Tan, Jasmine Si Jia
Wong, Chong Hui
Chen, Zhong
Keywords: Engineering::Materials
Issue Date: 2021
Source: Tan, J. S. J., Wong, C. H. & Chen, Z. (2021). Janus particle preparation through UV-induced partial photodegradation of spin-coated particle films. Langmuir, 37(27), 8167-8176.
Project: S15-1528-IPP
Journal: Langmuir
Abstract: Janus particles contain two or more chemical properties typically on opposing faces. With various property combinations possible, there are several potential applications, such as surfactants and drug delivery. However, scaling up the particle production process at reasonable cost is a limiting factor, and the method reported here aims to circumvent this issue. The process is based on a top-down destructive strategy that consists of two steps. Photocatalytic titanium dioxide particles prefunctionalized with a surface coating were assembled as particle films via spin-coating on a substrate. The particle films were placed directly under an ultraviolet light source, which induced the photodegradation of the surface coating only on the particle surfaces exposed to the light. The generated Janus particles were amphiphobic-amphiphilic in character. The Janus particles had a theoretical Janus balance close to ideal and remained attached at a hexane/water interface after disruption. They were able to make Pickering emulsions of water in silicone oil with a low energy input. The reported method may be easily scaled up to facilitate the production of gram-scale yields. The use of UV is clean and efficient and can be applied to semiconductor particles with surface coatings that are susceptible to photodegradation, making this method highly versatile.
ISSN: 0743-7463
DOI: 10.1021/acs.langmuir.1c00848
Schools: School of Materials Science and Engineering 
Organisations: Johnson & Johnson Pte Ltd
Rights: This document is the Accepted Manuscript version of a Published Work that appeared in final form in Langmuir, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see
Fulltext Permission: open
Fulltext Availability: With Fulltext
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