Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/156219
Title: Enhanced versatility of table-top X-rays from Van der Waals structures
Authors: Huang, Sunchao
Duan, Ruihuan
Pramanik, Nikhil
Boothroyd, Chris
Liu, Zheng
Wong, Liang Jie
Keywords: Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Issue Date: 2022
Source: Huang, S., Duan, R., Pramanik, N., Boothroyd, C., Liu, Z. & Wong, L. J. (2022). Enhanced versatility of table-top X-rays from Van der Waals structures. Advanced Science. https://dx.doi.org/10.1002/advs.202105401
Project: A1984c0043 
Journal: Advanced Science 
Abstract: Van der Waals (vdW) materials have attracted much interest for their myriad unique electronic, mechanical, and thermal properties. In particular, they are promising candidates for monochromatic, table-top X-ray sources. This work reveals that the versatility of the table-top vdW X-ray source goes beyond what has been demonstrated so far. By introducing a tilt angle between the vdW structure and the incident electron beam, it is theoretically and experimentally shown that the accessible photon energy range is more than doubled. This allows for greater versatility in real-time tuning of the vdW X-ray source. Furthermore, this work shows that the accessible photon energy range is maximized by simultaneously controlling both the electron energy and the vdW structure tilt. These results will pave the way for highly tunable, compact X-ray sources, with potential applications including hyperspectral X-ray fluoroscopy and X-ray quantum optics.
URI: https://hdl.handle.net/10356/156219
ISSN: 2198-3844
DOI: 10.1002/advs.202105401
DOI (Related Dataset): 10.21979/N9/WOZQL8
Schools: School of Electrical and Electronic Engineering 
Rights: © 2022 The Authors.Advanced Science published by Wiley-VCH GmbH.This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles

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