Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/156901
Title: Nanolithography for neuromorphic computing
Authors: Soh, Wei Liang
Keywords: Science::Physics::Atomic physics::Solid state physics
Issue Date: 2022
Publisher: Nanyang Technological University
Source: Soh, W. L. (2022). Nanolithography for neuromorphic computing. Final Year Project (FYP), Nanyang Technological University, Singapore. https://hdl.handle.net/10356/156901
Abstract: The report describes the fabrication of devices on a microscopic and nanoscopic scale through the use of the NanoFrazor machine, a thermal scanning probe lithography tool. It details the three components (namely, the etch stack, machine instructions and post-pattern procedures) for fabrication of devices, and any possible improvements to these components for better results.
URI: https://hdl.handle.net/10356/156901
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Student Reports (FYP/IA/PA/PI)

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