Please use this identifier to cite or link to this item:
Title: Nanolithography for neuromorphic computing
Authors: Soh, Wei Liang
Keywords: Science::Physics::Atomic physics::Solid state physics
Issue Date: 2022
Publisher: Nanyang Technological University
Source: Soh, W. L. (2022). Nanolithography for neuromorphic computing. Final Year Project (FYP), Nanyang Technological University, Singapore.
Abstract: The report describes the fabrication of devices on a microscopic and nanoscopic scale through the use of the NanoFrazor machine, a thermal scanning probe lithography tool. It details the three components (namely, the etch stack, machine instructions and post-pattern procedures) for fabrication of devices, and any possible improvements to these components for better results.
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Student Reports (FYP/IA/PA/PI)

Files in This Item:
File Description SizeFormat 
PH4415FYP-Soh Wei Liang-12Apr22.pdf
  Restricted Access
1.73 MBAdobe PDFView/Open

Page view(s)

Updated on May 17, 2022

Google ScholarTM


Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.