Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/160186
Title: Large-scale Huygens' metasurfaces for holographic 3D near-eye displays
Authors: Song, Weitao
Liang, Xinan
Li, Shiqiang
Li, Dongdong
Paniagua-Domínguez, Ramón
Lai, Keng Heng
Lin, Qunying
Zheng, Yuanjin
Kuznetsov, Arseniy I.
Keywords: Science::Physics
Issue Date: 2021
Source: Song, W., Liang, X., Li, S., Li, D., Paniagua-Domínguez, R., Lai, K. H., Lin, Q., Zheng, Y. & Kuznetsov, A. I. (2021). Large-scale Huygens' metasurfaces for holographic 3D near-eye displays. Laser and Photonics Reviews, 15(9), 2000538-. https://dx.doi.org/10.1002/lpor.202000538
Project: A18A7b0058
NRF-NRFI2017-01
Journal: Laser and Photonics Reviews
Abstract: Novel display technologies aim at providing the users with increasingly immersive experiences. In this regard, it is a long-sought dream to generate three-dimensional (3D) scenes with high resolution and continuous depth, which can be overlaid with the real world. Current attempts to do so, however, fail in providing either truly 3D information, or a large viewing area and angle, strongly limiting the user immersion. Here, we report a proof-of-concept solution for this problem, and realize a compact holographic 3D near-eye display with a large exit pupil of 10mm x 8.66mm. The 3D image is generated from a highly transparent Huygens metasurface hologram with large (>10^8) pixel count and subwavelength pixels, fabricated via deep-ultraviolet immersion photolithography on 300 mm glass wafers. We experimentally demonstrate high quality virtual 3D scenes with ~50k active data points and continuous depth ranging from 0.5m to 2m, overlaid with the real world and easily viewed by naked eye. To do so, we introduce a new design method for holographic near-eye displays that, inherently, is able to provide both parallax and accommodation cues, fundamentally solving the vergence-accommodation conflict that exists in current commercial 3D displays. Additionally, the complementary metal oxide semiconductor (CMOS) compatible, industry-grade fabrication technology employed opens new avenues for the large-scale, mass manufacturing of metasurfaces.
URI: https://hdl.handle.net/10356/160186
ISSN: 1863-8880
DOI: 10.1002/lpor.202000538
Schools: School of Electrical and Electronic Engineering 
Rights: © 2021 Wiley-VCH GmbH. All rights reserved.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:EEE Journal Articles

SCOPUSTM   
Citations 10

46
Updated on Mar 19, 2025

Web of ScienceTM
Citations 20

19
Updated on Oct 28, 2023

Page view(s)

171
Updated on Mar 26, 2025

Google ScholarTM

Check

Altmetric


Plumx

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.