Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/160557
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dc.contributor.authorWang, Xinglien_US
dc.contributor.authorGe, Junyuen_US
dc.contributor.authorAng, Nicole Ru-Xuanen_US
dc.contributor.authorLiang, Kunen_US
dc.contributor.authorTan, Chong Weien_US
dc.contributor.authorLi, Hongen_US
dc.contributor.authorTay, Beng Kangen_US
dc.date.accessioned2022-07-26T08:34:30Z-
dc.date.available2022-07-26T08:34:30Z-
dc.date.issued2022-
dc.identifier.citationWang, X., Ge, J., Ang, N. R., Liang, K., Tan, C. W., Li, H. & Tay, B. K. (2022). Low-power magnetron sputtering deposition of antimonene nanofilms for water splitting reaction. Micromachines, 13(3), 489-. https://dx.doi.org/10.3390/mi13030489en_US
dc.identifier.issn2072-666Xen_US
dc.identifier.urihttps://hdl.handle.net/10356/160557-
dc.description.abstractAntimonene (Sb) is a novel kind of two-dimensional (2D) material that is predicted to be promising for various applications, such as water splitting and semiconductor devices. Several methods have been reported to prepare Sb nanoflakes/nanofilms; however, it is still relatively difficult to prepare Sb nanofilms. In this work, a method of low-power magnetron sputtering deposition was used for the preparation of Sb nanofilms with lateral dimensions on the centimeter scale and controllable film thickness. It was found that the control of the deposition temperature is important for the final crystalline structure of the nanofilms. Furthermore, the application of the nanofilms as a catalyst for water splitting (hydrogen evolution reaction (HER) and oxygen evolution reaction (OER)) was demonstrated.en_US
dc.description.sponsorshipMinistry of Education (MOE)en_US
dc.language.isoenen_US
dc.relationMOE2019- T1-001-113en_US
dc.relation.ispartofMicromachinesen_US
dc.rights© 2022 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).en_US
dc.subjectEngineering::Electrical and electronic engineeringen_US
dc.titleLow-power magnetron sputtering deposition of antimonene nanofilms for water splitting reactionen_US
dc.typeJournal Articleen
dc.contributor.schoolSchool of Mechanical and Aerospace Engineeringen_US
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.contributor.researchCNRS International NTU THALES Research Alliancesen_US
dc.contributor.researchCentre for Micro- & Nano-Electronics (CMNE)en_US
dc.identifier.doi10.3390/mi13030489-
dc.description.versionPublished versionen_US
dc.identifier.pmid35334781-
dc.identifier.scopus2-s2.0-85127395928-
dc.identifier.issue3en_US
dc.identifier.volume13en_US
dc.identifier.spage489en_US
dc.subject.keywordsAntimoneneen_US
dc.subject.keywordsLow-Power Magnetron Sputtering Depositionen_US
dc.description.acknowledgementThis research was funded by the Ministry of Education, Singapore (Project ID: MOE2019- T1-001-113).en_US
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