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Title: Interfacial passivation with 4-chlorobenzene sulfonyl chloride for stable and efficient planar perovskite solar cells
Authors: Foo, Shini
Thambidurai, Mariyappan
Dewi, Herlina Arianita
Nur Fadilah Jamaludin
Bruno, Annalisa
Kanwat, Anil
Mathews, Nripan
Dang, Cuong
Nguyen, Hung D.
Keywords: Engineering::Electrical and electronic engineering
Issue Date: 2022
Source: Foo, S., Thambidurai, M., Dewi, H. A., Nur Fadilah Jamaludin, Bruno, A., Kanwat, A., Mathews, N., Dang, C. & Nguyen, H. D. (2022). Interfacial passivation with 4-chlorobenzene sulfonyl chloride for stable and efficient planar perovskite solar cells. Journal of Materials Chemistry C, 10(23), 9044-9051.
Project: MOET2EP50121-0012 
Journal: Journal of Materials Chemistry C 
Abstract: The interfacial passivation technique is an effective method to improve the stability and photovoltaic performance of perovskite solar cells. Here, we demonstrate the importance of passivating undercoordinated halide ions in minimizing carrier losses at the perovskite/spiro-OMeTAD interface. 4-Chlorobenzene sulfonyl chloride (CBSC) has been utilized as a Lewis acid passivation material. CBSC molecules act as electron acceptors, which bind to the negatively charged undercoordinated halide ions and Pb-I antisite defects (PbI3−). The champion CBSC-passivated perovskite device shows a high power conversion efficiency (PCE) of 20.02%, unlike the pristine device with an efficiency of 18.29%. Significant long term-stability in the CBSC passivated device is also observed, maintaining 93% of the initial PCE after 768 h stored in ambient conditions with 30% relative humidity.
ISSN: 2050-7526
DOI: 10.1039/d2tc00982j
Schools: School of Electrical and Electronic Engineering 
School of Materials Science and Engineering 
Research Centres: Energy Research Institute @ NTU (ERI@N) 
Centre for OptoElectronics and Biophotonics (COEB)
The Photonics Institute 
Rights: © 2022 The Royal Society of Chemistry. This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles
ERI@N Journal Articles
MSE Journal Articles

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