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Title: Lithography-free, high-density MoTe₂ nanoribbon arrays
Authors: Deng, Ya.
Zhu, Chao
Wang, Yu
Wang, Xiaowei
Zhao, Xiaoxu
Wu, Yao
Tang, Bijun
Duan, Ruihuan
Zhou, Kun
Liu, Zheng
Keywords: Engineering::Nanotechnology
Engineering::Materials::Nanostructured materials
Issue Date: 2022
Source: Deng, Y., Zhu, C., Wang, Y., Wang, X., Zhao, X., Wu, Y., Tang, B., Duan, R., Zhou, K. & Liu, Z. (2022). Lithography-free, high-density MoTe₂ nanoribbon arrays. Materials Today.
Project: NRF-CRP21-2018-0007 
Journal: Materials Today 
Abstract: Two-dimensional (2D) materials have shown a range of extraordinary properties including superconductivity, topological states and ferroelectricity. Among them, 2D arrays with emerging properties have drawn intense interest due to their great potentials in implementing high-density electric devices and advanced integrated circuits. The controllable synthesis of large arrays of 2D elements offers the key advance but remains unsolved. Here we report a one-step chemical vapor deposition (CVD) synthesis strategy for achieving single-crystalline MoTe2 nanoribbon arrays directly on normal SiO2/Si substrate, requiring neither the special stepped substrate nor the post-processing. The lithography-free synthesized ribbons are found to be well-aligned with a density ten times higher than that reported in MoS2. Further scanning transmission electron microscopy (STEM) and first-principles calculation results reveal a crystal-structure boosted solid–liquid-vapor (SLV) self-etching mechanism. Our findings provide a convenient synthesis strategy to achieve high-density nanoarrays that serve as platforms for integrated nanoscale electric devices.
ISSN: 1369-7021
DOI: 10.1016/j.mattod.2022.06.002
Schools: School of Materials Science and Engineering 
School of Mechanical and Aerospace Engineering 
Research Centres: Nanyang Environment and Water Research Institute 
Environmental Process Modelling Centre 
Rights: © 2022 Elsevier Ltd. All rights reserved. This paper was published in Materials Today and is made available with permission of Elsevier Ltd.
Fulltext Permission: embargo_20240712
Fulltext Availability: With Fulltext
Appears in Collections:MAE Journal Articles
MSE Journal Articles
NEWRI Journal Articles

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