Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/163868
Title: Fabrication of PtIrPd noble metal medium entropy alloy thin film by atomic layer deposition
Authors: Zou, Yiming
Jing, Lin
Wang, Leyan
Tan, Hui Teng
Goei, Ronn
Yong, Sidney Kwong Roong
Ong, Amanda Jiamin
Tan, Kwan Wee
Tok, Alfred Iing Yoong
Keywords: Engineering::Materials::Nanostructured materials
Issue Date: 2022
Source: Zou, Y., Jing, L., Wang, L., Tan, H. T., Goei, R., Yong, S. K. R., Ong, A. J., Tan, K. W. & Tok, A. I. Y. (2022). Fabrication of PtIrPd noble metal medium entropy alloy thin film by atomic layer deposition. Advanced Engineering Materials. https://dx.doi.org/10.1002/adem.202201263
Project: SERC A1983c0032 
MOET2EP 50221-0017 
Journal: Advanced Engineering Materials 
Abstract: Noble metal medium entropy alloy (MEA) thin films have recently attracted enormous research interests recently because of their great potential in the catalytic application. However, conventional bottom-up fabrication methods for MEA thin film such as magnetron sputtering face enormous challenges including precise control over film thickness and consumption of costly high-purity noble metal targets. Herein, a facile and tunable approach is developed coupling sequential atomic layer deposition (ALD) of noble metal layers with electric Joule heating (EJH) alloying process to grow platinum-iridium-palladium (PtIrPd) MEA thin films. The PtIrPd MEA thin film with a thickness of ≈20 nm and an atomic ratio of 35:35:30 is successfully fabricated. The effect of EJH processing temperature on the film morphology and structure evolution is investigated. ALD provides flexibility in the metal deposition sequence with meticulous thickness control and atomic composition precision, while the ultrafast EJH ramping/cooling rates promote homogeneous alloying of MEA combinations inhibiting phase separation. Furthermore, the integrated method circumvents a major obstacle of finding a common ALD temperature window for different noble metal precursors as well as opens new pathways for the controllable synthesis of multicomponent metal alloy thin films with potential catalytic, magnetic, and optical properties.
URI: https://hdl.handle.net/10356/163868
ISSN: 1438-1656
DOI: 10.1002/adem.202201263
Schools: School of Materials Science and Engineering 
Rights: © 2022 Wiley-VCH GmbH. All rights reserved. This is the peer reviewed version of the following article: Zou, Y., Jing, L., Wang, L., Tan, H. T., Goei, R., Yong, S. K. R., Ong, A. J., Tan, K. W. & Tok, A. I. Y. (2022). Fabrication of PtIrPd noble metal medium entropy alloy thin film by atomic layer deposition. Advanced Engineering Materials, which has been published in final form at https://doi.org/10.1002/adem.202201263. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Journal Articles

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