Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/164407
Title: Stereolithography assisted controllable random lasing device for tunable threshold, linewidth, and wavelength
Authors: Gummaluri, Venkata Siva
Matham, Murukeshan Vadakke
Keywords: Engineering::Mechanical engineering
Issue Date: 2022
Source: Gummaluri, V. S. & Matham, M. V. (2022). Stereolithography assisted controllable random lasing device for tunable threshold, linewidth, and wavelength. Advanced Engineering Materials. https://dx.doi.org/10.1002/adem.202200474
Project: RG119/21
Journal: Advanced Engineering Materials
Abstract: Additive manufacturing provides flexibility in making structures according to specific geometry requirements. Advances in this technology, including sophisticated laser-based stereolithography (SLA) technique, have paved the way to fabricate structures with layer resolutions up to 25 μm. Although the feasibility of random lasing is shown in 3D-printed structures, a study on varying lasing properties using SLA printing technique with continuous wave laser pumping is not studied yet in depth. Herein, SLA is used to fabricate structures conducive for random lasing. Randomly distributed vertical cylindrical microchannels are fabricated on a 1 cm × 1 cm photoresin chip of thickness 2 mm. The geometry of structures makes it viable for liquid optical gain media to be injected into the cylindrical channels. The random lasing characteristics are demonstrated including threshold and linewidths. Tunability in peak lasing wavelength, required threshold, and minimum achievable linewidth are demonstrated by changing the diameter of the microchannels. Further, it is shown that by changing the hole diameter from 260 to 470 μm, a wavelength tunability of approximately 22 nm is achieved. This structure expects to significantly contribute for its use as an on-chip photonic sensor, wherein liquid analytes achieved can be injected and sensed using optical parameters, and for on-chip spectroscopy applications.
URI: https://hdl.handle.net/10356/164407
ISSN: 1438-1656
DOI: 10.1002/adem.202200474
Rights: © 2022 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim. All rights reserved. This is the peer reviewed version of the following article: Gummaluri V & Matham MV. Stereolithography assisted controllable random lasing device for tunable threshold, linewidth, and wavelength. Advanced Engineering Materials, which has been published in final form at https://doi.org/10.1002/adem.202200474. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions.
Fulltext Permission: embargo_20231117
Fulltext Availability: With Fulltext
Appears in Collections:MAE Journal Articles

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