Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/164825
Title: Higher-order topological states in thermal diffusion
Authors: Wu, Haotian
Hu, Hao
Wang, Xixi
Xu, Zhixia
Zhang, Baile
Wang, Qi Jie
Zheng, Yuanjin
Zhang, Jingjing
Cui, Tie Jun
Luo, Yu
Keywords: Science::Physics
Issue Date: 2023
Source: Wu, H., Hu, H., Wang, X., Xu, Z., Zhang, B., Wang, Q. J., Zheng, Y., Zhang, J., Cui, T. J. & Luo, Y. (2023). Higher-order topological states in thermal diffusion. Advanced Materials, e2210825-. https://dx.doi.org/10.1002/adma.202210825
Project: MOE 2018-T2-2-189 (S) 
MOE2019-T2-2-085 
A18A7b0058 
A20E5c0095 
NRF-CRP22-2019-0006 
NRF-CRP23-2019-0007 
Journal: Advanced Materials
Abstract: Unlike conventional topological materials that carry topological states at their boundaries, higher-order topological materials are able to support topological states at boundaries of boundaries, such as corners and hinges. While band topology has been recently extended into thermal diffusion for thermal metamaterials, its realization is limited to a one-dimensional (1D) thermal lattice, lacking access to the higher-order topology. In this work, we report on the experimental realization of a higher-order thermal topological insulator in a generalized two-dimensional (2D) diffusion lattice. The topological corner states for thermal diffusion are observed in the bandgap of diffusion rate of the bulk, as a consequence of the anti-Hermitian nature of the diffusion Hamiltonian. The topological protection of these thermal corner states is demonstrated with the stability of their diffusion profile in the presence of amorphous deformation. Our work constitutes the first realization of higher-order topology in a purely diffusive systems, and opens the door for future thermal management with topological protection beyond 1D geometries.
URI: https://hdl.handle.net/10356/164825
ISSN: 0935-9648
DOI: 10.1002/adma.202210825
Schools: School of Electrical and Electronic Engineering 
School of Physical and Mathematical Sciences 
Research Centres: Centre for Disruptive Photonic Technologies (CDPT) 
Rights: © 2023 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim. All rights reserved. This is the accepted version of the following article: Wu, H., Hu, H., Wang, X., Xu, Z., Zhang, B., Wang, Q. J., Zheng, Y., Zhang, J., Cui, T. J. & Luo, Y. (2023). Higher-order topological states in thermal diffusion. Advanced Materials, e2210825-, which has been published in final form at https://doi.org/10.1002/adma.202210825. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions.
Fulltext Permission: embargo_20240209
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles
SPMS Journal Articles

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