Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/16686
Title: Thin film fabrication for optimal reflectivity coatings at 1064nm
Authors: Xiao, Zed Zhiqiang
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Issue Date: 2009
Abstract: In collaboration with Defence Science Organization, this project aim to achieve optimal reflectivity at 1064nm using Filter Cathodic Vacuum Arc (FCVA) technique. It involved fabrication of single and multi-layer thin film coating using Silicon and Titanium target. In this project, depositions are done on the Fused Silica and Yttrium aluminum garnet (YAG) to achieve highly reflective and anti-reflective respectively. Precise thickness of each layer is carefully observed to achieve the optimum result at 1064nm wavelength. The design which includes the thickness of each individual layer (using TiO2 and SiO2) is generated using the Essential Macleod program. This report includes a detailed description and the development of the project in this report. Apart from the above, various equipments used like FCVA, Surface Profiler, Scanning Electron Micrometer (SEM), Energy Dispersion X-ray (EDX) and UV VIS Spectrometer including the theoretical background will be covered in this report. The highlight for this report will be the results obtained from the fabricated single and multi layer coated samples and correlate it with the simulated result from the Essence Macleod software. Lastly, a propose development for the future of this project will be discuss and round-up the report with a conclusion.
URI: http://hdl.handle.net/10356/16686
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Student Reports (FYP/IA/PA/PI)

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