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https://hdl.handle.net/10356/168615
Title: | High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation | Authors: | Son, Bongkwon Shin, Sang-Ho Zhao, Zhi-Jun Ju, Byeong-Kwon Jeong, Jun-Ho Kim, Munho Tan, Chuan Seng |
Keywords: | Engineering::Electrical and electronic engineering | Issue Date: | 2023 | Source: | Son, B., Shin, S., Zhao, Z., Ju, B., Jeong, J., Kim, M. & Tan, C. S. (2023). High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation. Advanced Materials Technologies. https://dx.doi.org/10.1002/admt.202300131 | Project: | NRF-CRP19- 2017-01 T2EP50120-0001 T2EP50121-0002 A18A7b0058 A20E5c0095 MOE-2021-T1-002-031 (RG112/21) |
Journal: | Advanced Materials Technologies | Abstract: | Silicon (Si) nanowire (NW) array is a promising light-trapping platform due to the strong interaction between light and nanostructure. A photodetector benefits from the improved optical absorption in the Si NW array. Although the optical absorption increases with the NW length, the large NW length is not always preferable owing to the large surface area. Here, the systematic study on the Si NW array photodetectors with varied NW lengths is investigated. It is revealed that the photodetectors with 1 μm length provide a highest responsivity of 0.65 A W−1 and a specific detectivity of 1.40 × 109 cm Hz1/2 W−1 at the wavelength of 1000 nm, including the dark current of 54 μA at 1 V. In addition, the silicon oxide (SiOx) surface passivation is introduced to induce the high photogain. As a result, the responsivity is improved by 13 times (0.55 A W−1) at 1100 nm. This work proposes high-efficiency Si NW array photodetectors by the NW array length control and the SiOx surface passivation. | URI: | https://hdl.handle.net/10356/168615 | ISSN: | 2365-709X | DOI: | 10.1002/admt.202300131 | Schools: | School of Electrical and Electronic Engineering | Rights: | © 2023 Wiley-VCH GmbH. All rights reserved. This is the peer reviewed version of the following article: Son, B., Shin, S., Zhao, Z., Ju, B., Jeong, J., Kim, M. & Tan, C. S. (2023). High-efficiency silicon nanowire array near infrared photodetectors via length control and SiOx surface passivation. Advanced Materials Technologies, which has been published in final form at https://doi.org/10.1002/admt.202300131. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions. | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
Appears in Collections: | EEE Journal Articles |
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Si NW PD.pdf | 1.62 MB | Adobe PDF | ![]() View/Open |
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