Deep-UV metalens for high resolusion laser direct writing lithography

Abstract

Lithography is a crucial technology in semiconductor industry. Laser direct writing lithography is a maskless lithography technology, which uses laser to write the desired patterns directly on a target. The objective lens plays an important role in laser direct writing lithography, which focuses the laser beam to accurately on the target. Traditional optical objective lenses may have various shortcomings in use, such as insufficient resolution, aberration and so on. Metalenses may solve these problems. A metalens is an advanced flat optical device composed of artificial micro and nanostructures. The amplitude, phase, and polarization of the incident light can be engineered to satisfy the application requirements through metalenses. In this dissertation, we use a laser direct writing lithography system to test the lithography performance with metalens as the objective lens. The lithography process based on the metalens is investigated, and the minimum feature size of the system is measured and its potential applications are analyzed.