Please use this identifier to cite or link to this item:
Title: Computer control on deposition process in thin film transistor fabrication
Authors: Koh, Michelle Shi Hui.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Control and instrumentation::Control engineering
Issue Date: 2009
Abstract: Organic thin film transistors (OTFTs) have lived to see great improvements in the recent years. They prove to be competitive with existing or novel thin film transistor applications requiring large-area coverage, structural flexibility, low temperature processing and, especially low cost. Pentacene has been the most attractive material for OTFTs because of its high mobility and it is comparable to amorphous silicon thin film transistor. Physical Vapour Deposition (PVD) is a technique used to deposit thin film organic materials. In this report, a user interface will be implemented to control the operating temperature of the PVD system. This interface will allow the user to effectively monitor the temperature status in the deposition chamber. At the same time, PVD experiments will be carried out to deposit a thin layer of Pentacene at different temperatures. Various characterization of the pentacene layer will be carried out to investigate its optical properties such as photoluminescence and refractive index.
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Student Reports (FYP/IA/PA/PI)

Files in This Item:
File Description SizeFormat 
  Restricted Access
4.51 MBAdobe PDFView/Open

Google ScholarTM


Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.