Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/181336
Title: Polarization-entangled photon-pair source with van der Waals 3R-WS2 crystal
Authors: Feng, Jiangang
Wu, Yun-Kun
Duan, Ruihuan
Wang, Jun
Chen, Weijin
Qin, Jiazhang
Liu, Zheng
Guo, Guang-Can
Ren, Xi-Feng
Qiu, Cheng-Wei
Keywords: Engineering
Issue Date: 2024
Source: Feng, J., Wu, Y., Duan, R., Wang, J., Chen, W., Qin, J., Liu, Z., Guo, G., Ren, X. & Qiu, C. (2024). Polarization-entangled photon-pair source with van der Waals 3R-WS2 crystal. ELight, 4(1), 16-. https://dx.doi.org/10.1186/s43593-024-00074-6
Project: NRF-CRP26-2021-0004 
M23M2b0056 
Journal: eLight 
Abstract: Ultracompact entangled photon sources are pivotal to miniaturized quantum photonic devices. Van der Waals (vdW) nonlinear crystals promise efficient photon-pair generation and on-chip monolithic integration with nanophotonic circuitry. However, it remains challenging to generate maximally entangled Bell states of photon pairs with high purity, generation rate, and fidelity required for practical applications. Here, we realize a polarization-entangled photon-pair source based on spontaneous parametric down conversion in an ultrathin rhombohedral tungsten disulfide (3R-WS2) crystal. This vdW entangled photonic source exhibits a high photon-pair purity with a coincidence-to-accidental ratio of above 800, a generation rate of 31 Hz, and two maximally polarization-entangled Bell states with fidelities exceeding 0.93 and entanglement degree over 0.97. These results stem from scalable optical nonlinearity, enhanced second-order susceptibility by electronic transitions, and a well-defined symmetry-enabled selection rule inherent in 3R-WS2. Our polarization entangled photon source can be integrated with photonic structures for generating more complex entangled states, thus paving an avenue for advanced quantum photonic systems toward computation and metrology.
URI: https://hdl.handle.net/10356/181336
ISSN: 2097-1710
DOI: 10.1186/s43593-024-00074-6
Schools: School of Materials Science and Engineering 
Rights: © 2024 The Author(s). Open Access. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Journal Articles

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