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|Title:||Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits||Authors:||Qin, Fei Tao||Keywords:||DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits||Issue Date:||2003||Abstract:||In this MSC dissertation, the focus of the study has been on the effect of critical parameters of rapid thermal anneal on shallow implants for ultra-shallow junction formation. Spike anneal was found to be more effective than soak anneal for ultra-shallow function formation.||URI:||http://hdl.handle.net/10356/19276||Fulltext Permission:||restricted||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Theses|
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