Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/19276
Title: Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits
Authors: Qin, Fei Tao
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
Issue Date: 2003
Abstract: In this MSC dissertation, the focus of the study has been on the effect of critical parameters of rapid thermal anneal on shallow implants for ultra-shallow junction formation. Spike anneal was found to be more effective than soak anneal for ultra-shallow function formation.
URI: http://hdl.handle.net/10356/19276
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

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